Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process

Saved in:
Bibliographic Details
Published in:Journal of electronic materials 1997-11, Vol.26 (11), p.1320-1325
Main Authors: Eddy, C. R., Glembocki, O. J., Leonhardt, D., Shamamian, V. A., Holm, R. T., Thoms, B. D., Butler, J. E., Pang, S. W.
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0361-5235
1543-186X
DOI:10.1007/s11664-997-0078-8