Process optimization of polymetal (W/WN/polysilicon) gate and its impact on dynamic random-access memory chip performance in 0.14-(mu)m technology

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Bibliographic Details
Published in:Journal of electronic materials 2002-10, Vol.31 (10), p.988
Main Authors: Shim, Pil Bo, Jun-Ho, Choy, Gyung Sun Gil, Ki Myung Kyung, Park, Ju Cheol
Format: Article
Language:English
Online Access:Get full text
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ISSN:0361-5235
1543-186X