Loading…

Characterization of Zn2SnO4 Thin Films Prepared by RF Magnetron Sputtering

Zn 2 SnO 4 (ZTO) is a stable semiconductor in ZnO–SnO 2 system and important transparent conducting oxide (TCO) predominantly used in optoelectronic devices. ZTO thin films were prepared by RF magnetron sputtering using Zn 2 SnO 4 ceramic target in this paper. The effects of annealing temperatures a...

Full description

Saved in:
Bibliographic Details
Published in:Russian journal of physical chemistry. B 2018-05, Vol.12 (3), p.503-509
Main Authors: Tang, Tian Yu, Ren, Sheng Qiang, Liu, Yuan, Zhang, Jing Quan, Liu, Cai, Wu, Li Li, Wang, Wen Wu, Li, Wei, Feng, Liang Huan
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Zn 2 SnO 4 (ZTO) is a stable semiconductor in ZnO–SnO 2 system and important transparent conducting oxide (TCO) predominantly used in optoelectronic devices. ZTO thin films were prepared by RF magnetron sputtering using Zn 2 SnO 4 ceramic target in this paper. The effects of annealing temperatures and oxygen contents on characterization of ZTO thin films were studied. The results show that ZTO thin films prepared by RF magnetron sputtering are amorphous with an optical band gap of 3.22 eV. After annealing at 650°C in Ar atmosphere for 40 min, ZTO films possess a spinel structure with an optical band gap of 3.62 eV. The atomic force microscope (AFM) data of morphology reveals that the surface roughness of films is about 2 nm. The results of energy dispersive spectrometer (EDS) show that the concentration ratio of Zn to Sn is in the range from 1.44 to 1.57. The results of Hall-effect-measurement system reveal that the resistivity of films varies from 102 to 10–1 Ωcm, carrier concentration is about 10 17 cm –3 , and mobility ranges from 10 0 to 10 1 cm 2 v –1 s –1 .
ISSN:1990-7931
1990-7923
DOI:10.1134/S1990793118030181