Fractal analysis of BaF2 thin films deposited on different substrates

Barrium fluoride (BaF2) thin films were prepared by electron beam evaporation technique at room temperature, on glass, Silicon and Aluminum substrates having thickness of 20 nm each. Its structural property and surface morphology were studied using glancing angle X-ray diffraction (GAXRD) and atomic...

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Bibliographic Details
Published in:arXiv.org 2017-05
Main Authors: Kavyashree, Pandey, R K, Yadav, R P, Kumar, Manvendra, Mittal, A K, Pandey, A C, Pandey, S N
Format: Article
Language:English
Subjects:
Algorithms
Aluminum
Atomic force microscopy
Barium fluorides
Electron beams
Fractal analysis
Fractal geometry
Fractals
Glass substrates
Morphology
Silicon substrates
Surface roughness
Thin films
X-ray diffraction
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Summary:Barrium fluoride (BaF2) thin films were prepared by electron beam evaporation technique at room temperature, on glass, Silicon and Aluminum substrates having thickness of 20 nm each. Its structural property and surface morphology were studied using glancing angle X-ray diffraction (GAXRD) and atomic force microscopy (AFM) respectively. It was found that grain size, average surface roughness and interface width changes with different substrates. Higuchi algorithm is applied for the fractal measure on AFM images.It was observed found that the fractal dimension varied from substrate to substrate.
ISSN:2331-8422