Electrical and structural properties of epitaxially deposited chromium thin films

We studied the electrical resistance and crystal structure of epitaxial chromium (Cr) films. The lattice constant of the Cr films was larger than that of the bulk Cr because of MgO substrate on which Cr was epitaxially deposited. A chromium oxide layer having a thickness of 1 nm was found on all fil...

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Bibliographic Details
Published in:Physica. B, Condensed matter Condensed matter, 2018-05, Vol.536, p.790-792
Main Authors: Ohashi, M., Sawabu, M., Nakanishi, H., Ohashi, K., Maeta, K.
Format: Article
Language:English
Subjects:
Antiferromagnetism
Chromium
Chromium oxides
Cr film
Crystal lattices
Crystal structure
Electric properties
Electric resistance
Electrical resistivity
Epitaxy
Lattice parameters
Magnetism
Quantum critical point
Substrates
Thickness
Thin films
X-ray reflectivity
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Summary:We studied the electrical resistance and crystal structure of epitaxial chromium (Cr) films. The lattice constant of the Cr films was larger than that of the bulk Cr because of MgO substrate on which Cr was epitaxially deposited. A chromium oxide layer having a thickness of 1 nm was found on all films from the result of X-ray reflectivity measurements. The electrical resistivity ρ(T) shows metallic behavior for all epitaxial Cr films in contrast with polycrystalline one. However, the magnitude of ρ tends to increase and the antiferromagnetic interaction is suppressed as decreasing thickness of film.
ISSN:0921-4526
1873-2135
DOI:10.1016/j.physb.2017.10.040