The correlations of multi-wave band luminosity and BLR luminosity in Fermi 2LAC blazars

We collect a sample of 78 Fermi detected blazars with broad line region (BLR) data and the quasi-simultaneous multi-wave band data. By analyzing the sample, we find: (1) For whole blazar sample, there exist significant correlations between radio, \(\gamma\)-ray luminosity and BLR luminosity. The slo...

Full description

Saved in:
Bibliographic Details
Published in:arXiv.org 2017-08
Main Authors: Wang, Zerui, Xue, Rui, Xie, Zhaohua, Du, Leiming, Tingfeng Yi, Xu, Yunbing, Liu, Wenguang
Format: Article
Language:English
Subjects:
Blazars
Correlation
Dilution
Elastic scattering
Emission
Luminosity
Photons
Radio
Regression analysis
Symbiosis
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We collect a sample of 78 Fermi detected blazars with broad line region (BLR) data and the quasi-simultaneous multi-wave band data. By analyzing the sample, we find: (1) For whole blazar sample, there exist significant correlations between radio, \(\gamma\)-ray luminosity and BLR luminosity. The slope of the best-fit linear regression equation is close to the theoretical value 1. Our results provided another support of jet-disk symbiosis. (2) For FSRQ sample, we find a significant correlation between radio luminosity and optical luminosity, and weaker correlations between X-ray luminosity and radio, optical luminosity. It indicates that the X-ray band radiation mechanism is slightly different from radio and optical bands. The X-ray emission is diluted by inverse Compton scattering (IC). There is a significant correlation between BLR luminosity and \(\gamma\)-ray luminosity, but no correlations between X-ray luminosity and BLR, \(\gamma\)-ray luminosity, which suggests that the seed soft photons are different for IC process. From these results we suggest that the X-ray band emission is diluted by synchrotron self-Compton (SSC) process, \(\gamma\)-ray band emission is produced by external Compton (EC) process.
ISSN:2331-8422
DOI:10.48550/arxiv.1708.08203