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Resonant structures based on amorphous silicon sub-oxide doped with Er3+ with silicon nanoclusters for an efficient emission at 1550 nm

We present a resonant approach to enhance 1550nm emission efficiency of amorphous silicon sub-oxide doped with Er3+ (a-SiOx) layers with silicon nanoclusters (Si-NC). Two distinct techniques were combined to provide a structure that allowed increasing approximately 12x the 1550nm emission. First, la...

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Published in:arXiv.org 2009-06
Main Authors: Figueira, D S L, Mustafa, D, Tessler, L R, Frateschi, N C
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description We present a resonant approach to enhance 1550nm emission efficiency of amorphous silicon sub-oxide doped with Er3+ (a-SiOx) layers with silicon nanoclusters (Si-NC). Two distinct techniques were combined to provide a structure that allowed increasing approximately 12x the 1550nm emission. First, layers of SiO2 were obtained by conventional wet oxidation and a-SiOx matrix was deposited by reactive RF co-sputtering. Secondly, an extra pump channel (4I15/2 to 4I9/2) of Er3+ was created due to Si-NC formation on the same a-SiOx matrix via a hard annealing at 1150 C. The SiO2 and the a-SiOx thicknesses were designed to support resonances near the pumping wavelength (~500nm), near the Si-NC emission (~800nm) and near the a-SiOx emission (~1550nm) enhancing the optical pumping process.
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fullrecord <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_journals_2081167304</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2081167304</sourcerecordid><originalsourceid>FETCH-LOGICAL-a514-eeb35f441a19e2141f9ccf9f23dd4e2687e1467426e7424ea9e6a57af51af32b3</originalsourceid><addsrcrecordid>eNo1jk9LAzEUxIMgWGrvHgMeZWv-7-5RStVCQZDeS3b3haa0m5qXaL-BX9tI9TLvMQy_GULuOJurRmv2aOPZf85Zy8xcilpdkYmQkleNEuKGzBD3jDFhaqG1nJDvd8Aw2jFRTDH3KUdA2lmEgYaR2mOIp13ISNEffF8czF0Vzn4AOoRTCX35tKPLKB8u33-sEEN_yJggInUhUjtScM73HkoVHD2i_-UnystkOh5vybWzB4TZ352SzfNys3it1m8vq8XTurKaqwqgk9opxS1vQXDFXdv3rnVCDoMCYZoauDK1EgaKKLAtGKtr6zS3TopOTsn9BXuK4SMDpu0-5DiWxq1gDeemlkzJH1KFZHU</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2081167304</pqid></control><display><type>article</type><title>Resonant structures based on amorphous silicon sub-oxide doped with Er3+ with silicon nanoclusters for an efficient emission at 1550 nm</title><source>Publicly Available Content Database</source><creator>Figueira, D S L ; Mustafa, D ; Tessler, L R ; Frateschi, N C</creator><creatorcontrib>Figueira, D S L ; Mustafa, D ; Tessler, L R ; Frateschi, N C</creatorcontrib><description>We present a resonant approach to enhance 1550nm emission efficiency of amorphous silicon sub-oxide doped with Er3+ (a-SiOx) layers with silicon nanoclusters (Si-NC). Two distinct techniques were combined to provide a structure that allowed increasing approximately 12x the 1550nm emission. First, layers of SiO2 were obtained by conventional wet oxidation and a-SiOx matrix was deposited by reactive RF co-sputtering. Secondly, an extra pump channel (4I15/2 to 4I9/2) of Er3+ was created due to Si-NC formation on the same a-SiOx matrix via a hard annealing at 1150 C. The SiO2 and the a-SiOx thicknesses were designed to support resonances near the pumping wavelength (~500nm), near the Si-NC emission (~800nm) and near the a-SiOx emission (~1550nm) enhancing the optical pumping process.</description><identifier>EISSN: 2331-8422</identifier><identifier>DOI: 10.48550/arxiv.0906.3274</identifier><language>eng</language><publisher>Ithaca: Cornell University Library, arXiv.org</publisher><subject>Amorphous silicon ; Emission ; Nanoclusters ; Optical pumping ; Photovoltaic cells ; Silicon dioxide ; Wet oxidation</subject><ispartof>arXiv.org, 2009-06</ispartof><rights>2009. This work is published under http://arxiv.org/licenses/nonexclusive-distrib/1.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.proquest.com/docview/2081167304?pq-origsite=primo$$EHTML$$P50$$Gproquest$$Hfree_for_read</linktohtml><link.rule.ids>780,784,25752,27924,37011,44589</link.rule.ids></links><search><creatorcontrib>Figueira, D S L</creatorcontrib><creatorcontrib>Mustafa, D</creatorcontrib><creatorcontrib>Tessler, L R</creatorcontrib><creatorcontrib>Frateschi, N C</creatorcontrib><title>Resonant structures based on amorphous silicon sub-oxide doped with Er3+ with silicon nanoclusters for an efficient emission at 1550 nm</title><title>arXiv.org</title><description>We present a resonant approach to enhance 1550nm emission efficiency of amorphous silicon sub-oxide doped with Er3+ (a-SiOx) layers with silicon nanoclusters (Si-NC). Two distinct techniques were combined to provide a structure that allowed increasing approximately 12x the 1550nm emission. First, layers of SiO2 were obtained by conventional wet oxidation and a-SiOx matrix was deposited by reactive RF co-sputtering. Secondly, an extra pump channel (4I15/2 to 4I9/2) of Er3+ was created due to Si-NC formation on the same a-SiOx matrix via a hard annealing at 1150 C. The SiO2 and the a-SiOx thicknesses were designed to support resonances near the pumping wavelength (~500nm), near the Si-NC emission (~800nm) and near the a-SiOx emission (~1550nm) enhancing the optical pumping process.</description><subject>Amorphous silicon</subject><subject>Emission</subject><subject>Nanoclusters</subject><subject>Optical pumping</subject><subject>Photovoltaic cells</subject><subject>Silicon dioxide</subject><subject>Wet oxidation</subject><issn>2331-8422</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><sourceid>PIMPY</sourceid><recordid>eNo1jk9LAzEUxIMgWGrvHgMeZWv-7-5RStVCQZDeS3b3haa0m5qXaL-BX9tI9TLvMQy_GULuOJurRmv2aOPZf85Zy8xcilpdkYmQkleNEuKGzBD3jDFhaqG1nJDvd8Aw2jFRTDH3KUdA2lmEgYaR2mOIp13ISNEffF8czF0Vzn4AOoRTCX35tKPLKB8u33-sEEN_yJggInUhUjtScM73HkoVHD2i_-UnystkOh5vybWzB4TZ352SzfNys3it1m8vq8XTurKaqwqgk9opxS1vQXDFXdv3rnVCDoMCYZoauDK1EgaKKLAtGKtr6zS3TopOTsn9BXuK4SMDpu0-5DiWxq1gDeemlkzJH1KFZHU</recordid><startdate>20090617</startdate><enddate>20090617</enddate><creator>Figueira, D S L</creator><creator>Mustafa, D</creator><creator>Tessler, L R</creator><creator>Frateschi, N C</creator><general>Cornell University Library, arXiv.org</general><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>L6V</scope><scope>M7S</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope></search><sort><creationdate>20090617</creationdate><title>Resonant structures based on amorphous silicon sub-oxide doped with Er3+ with silicon nanoclusters for an efficient emission at 1550 nm</title><author>Figueira, D S L ; Mustafa, D ; Tessler, L R ; Frateschi, N C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a514-eeb35f441a19e2141f9ccf9f23dd4e2687e1467426e7424ea9e6a57af51af32b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Amorphous silicon</topic><topic>Emission</topic><topic>Nanoclusters</topic><topic>Optical pumping</topic><topic>Photovoltaic cells</topic><topic>Silicon dioxide</topic><topic>Wet oxidation</topic><toplevel>online_resources</toplevel><creatorcontrib>Figueira, D S L</creatorcontrib><creatorcontrib>Mustafa, D</creatorcontrib><creatorcontrib>Tessler, L R</creatorcontrib><creatorcontrib>Frateschi, N C</creatorcontrib><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science &amp; Engineering Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central</collection><collection>SciTech Premium Collection</collection><collection>ProQuest Engineering Collection</collection><collection>Engineering Database</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><jtitle>arXiv.org</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Figueira, D S L</au><au>Mustafa, D</au><au>Tessler, L R</au><au>Frateschi, N C</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Resonant structures based on amorphous silicon sub-oxide doped with Er3+ with silicon nanoclusters for an efficient emission at 1550 nm</atitle><jtitle>arXiv.org</jtitle><date>2009-06-17</date><risdate>2009</risdate><eissn>2331-8422</eissn><abstract>We present a resonant approach to enhance 1550nm emission efficiency of amorphous silicon sub-oxide doped with Er3+ (a-SiOx) layers with silicon nanoclusters (Si-NC). Two distinct techniques were combined to provide a structure that allowed increasing approximately 12x the 1550nm emission. First, layers of SiO2 were obtained by conventional wet oxidation and a-SiOx matrix was deposited by reactive RF co-sputtering. Secondly, an extra pump channel (4I15/2 to 4I9/2) of Er3+ was created due to Si-NC formation on the same a-SiOx matrix via a hard annealing at 1150 C. The SiO2 and the a-SiOx thicknesses were designed to support resonances near the pumping wavelength (~500nm), near the Si-NC emission (~800nm) and near the a-SiOx emission (~1550nm) enhancing the optical pumping process.</abstract><cop>Ithaca</cop><pub>Cornell University Library, arXiv.org</pub><doi>10.48550/arxiv.0906.3274</doi><oa>free_for_read</oa></addata></record>
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subjects Amorphous silicon
Emission
Nanoclusters
Optical pumping
Photovoltaic cells
Silicon dioxide
Wet oxidation
title Resonant structures based on amorphous silicon sub-oxide doped with Er3+ with silicon nanoclusters for an efficient emission at 1550 nm
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T20%3A47%3A45IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Resonant%20structures%20based%20on%20amorphous%20silicon%20sub-oxide%20doped%20with%20Er3+%20with%20silicon%20nanoclusters%20for%20an%20efficient%20emission%20at%201550%20nm&rft.jtitle=arXiv.org&rft.au=Figueira,%20D%20S%20L&rft.date=2009-06-17&rft.eissn=2331-8422&rft_id=info:doi/10.48550/arxiv.0906.3274&rft_dat=%3Cproquest%3E2081167304%3C/proquest%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-a514-eeb35f441a19e2141f9ccf9f23dd4e2687e1467426e7424ea9e6a57af51af32b3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2081167304&rft_id=info:pmid/&rfr_iscdi=true