Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures

We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free deposition on a silicon dioxide substrate. This depo...

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Bibliographic Details
Published in:arXiv.org 2011-05
Main Authors: Goler, Sarah, Piazza, Vincenzo, Roddaro, Stefano, Pellegrini, Vittorio, Beltram, Fabio, Pingue, Pasqualantonio
Format: Article
Language:English
Subjects:
Atomic force microscopy
Blistering
Deposition
Electron beam lithography
Etching
Graphene
Graphite
Microscopy
Polydimethylsiloxane
Raman spectroscopy
Scanning electron microscopy
Self-assembly
Silicon dioxide
Silicon substrates
Transfer printing
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Summary:We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free deposition on a silicon dioxide substrate. This deposition system creates a blistered graphene surface due to strain induced by the transfer process itself. Single-layer-graphene deposition and its "blistering" on the substrate are demonstrated by a combination of Raman spectroscopy, scanning electron microscopy and atomic-force microscopy measurements. Finally, we demonstrate that blister-like suspended graphene are self-supporting single-layer structures and can be flattened by employing a spatially-resolved direct-lithography technique based on electron-beam induced etching.
ISSN:2331-8422
DOI:10.48550/arxiv.1105.5710