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Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures
We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free deposition on a silicon dioxide substrate. This depo...
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Published in: | arXiv.org 2011-05 |
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creator | Goler, Sarah Piazza, Vincenzo Roddaro, Stefano Pellegrini, Vittorio Beltram, Fabio Pingue, Pasqualantonio |
description | We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free deposition on a silicon dioxide substrate. This deposition system creates a blistered graphene surface due to strain induced by the transfer process itself. Single-layer-graphene deposition and its "blistering" on the substrate are demonstrated by a combination of Raman spectroscopy, scanning electron microscopy and atomic-force microscopy measurements. Finally, we demonstrate that blister-like suspended graphene are self-supporting single-layer structures and can be flattened by employing a spatially-resolved direct-lithography technique based on electron-beam induced etching. |
doi_str_mv | 10.48550/arxiv.1105.5710 |
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subjects | Atomic force microscopy Blistering Deposition Electron beam lithography Etching Graphene Graphite Microscopy Polydimethylsiloxane Raman spectroscopy Scanning electron microscopy Self-assembly Silicon dioxide Silicon substrates Transfer printing |
title | Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures |
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