Second harmonic microscopy of monolayer MoS2

We show that the lack of inversion symmetry in monolayer MoS2 allows strong optical second harmonic generation. Second harmonic of an 810-nm pulse is generated in a mechanically exfoliated monolayer, with a nonlinear susceptibility on the order of 1E-7 m/V. The susceptibility reduces by a factor of...

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Bibliographic Details
Published in:arXiv.org 2013-04
Main Authors: Kumar, Nardeep, Najmaei, Sina, Cui, Qiannan, Ceballos, Frank, Ajayan, Pulickel M, Lou, Jun, Zhao, Hui
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Crystal structure
Microscopy
Molybdenum disulfide
Monolayers
Organic chemistry
Second harmonic generation
Single crystals
Thickness
Thin films
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Summary:We show that the lack of inversion symmetry in monolayer MoS2 allows strong optical second harmonic generation. Second harmonic of an 810-nm pulse is generated in a mechanically exfoliated monolayer, with a nonlinear susceptibility on the order of 1E-7 m/V. The susceptibility reduces by a factor of seven in trilayers, and by about two orders of magnitude in even layers. A proof-of-principle second harmonic microscopy measurement is performed on samples grown by chemical vapor deposition, which illustrates potential applications of this effect in fast and non-invasive detection of crystalline orientation, thickness uniformity, layer stacking, and single-crystal domain size of atomically thin films of MoS2 and similar materials.
ISSN:2331-8422
DOI:10.48550/arxiv.1302.3935