Hydrogen-Permeability of Titanium-Nitride (TiN) Coatings Obtained via the Plasma-Immersion Ion Implantation of Titanium and TiN Vacuum-Arc Deposition on Zr−1%Nb Alloy

The surface of Zr‒1%Nb zirconium-alloy samples is treated with titanium via plasma-immersion ion implantation (PIII). Afterward, TiN coatings are deposited onto the implanted and initial samples by means of vacuum-arc deposition (VAD). Before and after each of the treatments mentioned above, changes...

Full description

Saved in:
Bibliographic Details
Published in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2018-07, Vol.12 (4), p.705-709
Main Authors: Zhang, Le, Nikitenkov, N. N., Sutygina, A. N., Kashkarov, E. B., Sypchenko, V. S., Babihina, M. N.
Format: Article
Language:English
Subjects:
Arc deposition
Chemistry and Materials Science
Coatings
Hydrogen
Ion implantation
Materials Science
Niobium
Permeability
Sorption
Submerging
Substrates
Surfaces and Interfaces
Thin Films
Titanium
Topography
Zirconium base alloys
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The surface of Zr‒1%Nb zirconium-alloy samples is treated with titanium via plasma-immersion ion implantation (PIII). Afterward, TiN coatings are deposited onto the implanted and initial samples by means of vacuum-arc deposition (VAD). Before and after each of the treatments mentioned above, changes in the hydrogen sorption rate, depth distribution of elements, and surface topography are investigated. It is found that separately performed VAD and PIII reduce the hydrogen sorption rate by a factor of 2‒15. At the same time, a combination of operations so that PIII is carried out before VAD decreases the sorption rate by one‒two orders of magnitude. It is revealed that the key parameter of the aforementioned methods affecting hydrogen permeability, the depth distribution of elements, and the surface topography is the bias value applied to the sample (substrate). In the case of our setup, the optimum biases of PIII and VAD are‒1500 and‒150 V, respectively.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451018040080