Sub-Rayleigh lithography using high flux loss-resistant entangled states of light

Quantum lithography achieves phase super-resolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable, with reduced use of quantum resources and consequently enhanced resistance to loss. The sc...

Full description

Saved in:
Bibliographic Details
Published in:arXiv.org 2012-01
Main Authors: Rosen, Shamir, Afek, Itai, Israel, Yonatan, Oron Ambar, Silberberg, Yaron
Format: Article
Language:English
Subjects:
Coherent light
Entangled states
Interference fringes
Lithography
Multiphoton absorption
Photons
Quantum theory
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Quantum lithography achieves phase super-resolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable, with reduced use of quantum resources and consequently enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of an SPDC entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the non-classical light required for creating NOON states.
ISSN:2331-8422
DOI:10.48550/arxiv.1201.0637