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High TMR ratio in Co2FeSi and Fe2CoSi based magnetic tunnel junctions
Magnetic tunnel junctions with Fe1+xCo2-xSi (0 < x < 1) electrodes and MgO barrier were prepared on MgO substrates by magnetron co-sputtering. Maximum tunnel magnetoresistance (TMR) ratios of 262 % at 15 K and 159 % at room temperature were observed for x=0.75. Correlations of the annealing te...
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description | Magnetic tunnel junctions with Fe1+xCo2-xSi (0 < x < 1) electrodes and MgO barrier were prepared on MgO substrates by magnetron co-sputtering. Maximum tunnel magnetoresistance (TMR) ratios of 262 % at 15 K and 159 % at room temperature were observed for x=0.75. Correlations of the annealing temperature dependent atomic ordering and TMR amplitude are discussed. The high TMR for an intermediate stoichiometry is ascribed to the adjustment of the Fermi energy within a minority spin pseudo gap. |
doi_str_mv | 10.48550/arxiv.1308.2072 |
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subjects | Computer memory Magnesium oxide Magnetoresistance Magnetoresistivity Stoichiometry Substrates Temperature dependence Tunnel junctions Tunnel magnetoresistance |
title | High TMR ratio in Co2FeSi and Fe2CoSi based magnetic tunnel junctions |
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