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Temperature and frequency dependence of dielectric relaxation and AC electrical conductivity in p-Si/CuPc hybrid photodiode

Thermal evaporation technique has been used to fabricate a hybrid heterojunction Al/p-Si/CuPc/Au photodiode by deposition of a CuPc thin film onto a p-Si substrate. The dark I – V curves exhibit diode-like behavior. The impedance characteristics of the Al/p-Si/CuPc/Au hybrid heterojunction were exam...

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2018-09, Vol.124 (9), p.1-13, Article 591
Main Authors: Shehata, M. M., Abdelhady, K.
Format: Article
Language:English
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Summary:Thermal evaporation technique has been used to fabricate a hybrid heterojunction Al/p-Si/CuPc/Au photodiode by deposition of a CuPc thin film onto a p-Si substrate. The dark I – V curves exhibit diode-like behavior. The impedance characteristics of the Al/p-Si/CuPc/Au hybrid heterojunction were examined using complex impedance spectroscopy. In the investigated device, the activation energies have been obtained from Arrhenius plotting of two relaxation processes. The Cole–Cole plot and the electrical conductivity were reported and showed that the heterostructure possesses a negative temperature coefficient of resistance. The excess minority carrier lifetimes, the diffusion coefficients and the mobilities of charge carriers at two interfaces were calculated and interpreted. From the impedance spectra analysis, the band profile of the studied device can be fully determined.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-018-2006-6