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Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics
In this paper, we show the first production of Cu-based electrode materials including self-assembled barrier layers which can prevent Cu-Si inter-diffusion during sintering and are expected to be applicable to crystalline Si photovoltaics. The characteristics of electrodes produced by mixed Cu-P/Sn...
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Published in: | Journal of alloys and compounds 2018-08, Vol.757, p.333-339 |
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description | In this paper, we show the first production of Cu-based electrode materials including self-assembled barrier layers which can prevent Cu-Si inter-diffusion during sintering and are expected to be applicable to crystalline Si photovoltaics. The characteristics of electrodes produced by mixed Cu-P/Sn pastes at various compositions were evaluated. Electrodes sintered in an atmospheric environment showed electrical resistivity of below 1 × 10−4 Ω・cm. In addition, the formation of compounds such as Cu3Si at the Si surface was prevented with a Sn particle ratio ranging between 20 and 60 wt%. The structural analysis revealed that the electrode included not only a Cu-Sn IMCs network but also a self-assembled Sn-P-O glass phase between the Cu-Sn IMCs network and the Si substrate, capable of forming a barrier layer to prevent Cu-Si inter-diffusion. These results may enable the widespread use of atmospherically sintered Cu-based electrode for the mass production of next-generation crystalline Si solar cells. Subsequently, the manner in which the Sn-P-O glasses were formed was discussed using a thermos-dynamical approach.
[Display omitted]
•Cu-based electrodes applicable to the forming on Si substrate were reported.•The electrode paste includes Cu-P alloy and Sn particles.•Cu-P + Sn electrodes had no Cu-Si compounds at the Si surface.•A self-assembled Sn-P-O glass phase can prevent Cu-Si inter-diffusion. |
doi_str_mv | 10.1016/j.jallcom.2018.05.086 |
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[Display omitted]
•Cu-based electrodes applicable to the forming on Si substrate were reported.•The electrode paste includes Cu-P alloy and Sn particles.•Cu-P + Sn electrodes had no Cu-Si compounds at the Si surface.•A self-assembled Sn-P-O glass phase can prevent Cu-Si inter-diffusion.</description><identifier>ISSN: 0925-8388</identifier><identifier>EISSN: 1873-4669</identifier><identifier>DOI: 10.1016/j.jallcom.2018.05.086</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Atmosphere ; Barrier layers ; Copper ; Copper alloys ; Copper base alloys ; Crystal structure ; Crystallinity ; Diffusion barriers ; Diffusion layers ; Electrode materials ; Electrodes ; Mass production ; Pastes ; Photovoltaic cells ; Self-assembled barrier layer ; Self-assembly ; Silicon ; Silicon substrates ; Sintering ; Solar cells ; Structural analysis ; Substrates ; Tin</subject><ispartof>Journal of alloys and compounds, 2018-08, Vol.757, p.333-339</ispartof><rights>2018 Elsevier B.V.</rights><rights>Copyright Elsevier BV Aug 15, 2018</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c374t-64edb659e2673a3061f79c7c6b8b1d0ab3034491ec8532d83a39b8dbef8e97683</citedby><cites>FETCH-LOGICAL-c374t-64edb659e2673a3061f79c7c6b8b1d0ab3034491ec8532d83a39b8dbef8e97683</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Adachi, Shuichiro</creatorcontrib><creatorcontrib>Nojiri, Takeshi</creatorcontrib><creatorcontrib>Kato, Takahiko</creatorcontrib><creatorcontrib>Watanabe, Seiichi</creatorcontrib><creatorcontrib>Yoshida, Masato</creatorcontrib><title>Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics</title><title>Journal of alloys and compounds</title><description>In this paper, we show the first production of Cu-based electrode materials including self-assembled barrier layers which can prevent Cu-Si inter-diffusion during sintering and are expected to be applicable to crystalline Si photovoltaics. The characteristics of electrodes produced by mixed Cu-P/Sn pastes at various compositions were evaluated. Electrodes sintered in an atmospheric environment showed electrical resistivity of below 1 × 10−4 Ω・cm. In addition, the formation of compounds such as Cu3Si at the Si surface was prevented with a Sn particle ratio ranging between 20 and 60 wt%. The structural analysis revealed that the electrode included not only a Cu-Sn IMCs network but also a self-assembled Sn-P-O glass phase between the Cu-Sn IMCs network and the Si substrate, capable of forming a barrier layer to prevent Cu-Si inter-diffusion. These results may enable the widespread use of atmospherically sintered Cu-based electrode for the mass production of next-generation crystalline Si solar cells. Subsequently, the manner in which the Sn-P-O glasses were formed was discussed using a thermos-dynamical approach.
[Display omitted]
•Cu-based electrodes applicable to the forming on Si substrate were reported.•The electrode paste includes Cu-P alloy and Sn particles.•Cu-P + Sn electrodes had no Cu-Si compounds at the Si surface.•A self-assembled Sn-P-O glass phase can prevent Cu-Si inter-diffusion.</description><subject>Atmosphere</subject><subject>Barrier layers</subject><subject>Copper</subject><subject>Copper alloys</subject><subject>Copper base alloys</subject><subject>Crystal structure</subject><subject>Crystallinity</subject><subject>Diffusion barriers</subject><subject>Diffusion layers</subject><subject>Electrode materials</subject><subject>Electrodes</subject><subject>Mass production</subject><subject>Pastes</subject><subject>Photovoltaic cells</subject><subject>Self-assembled barrier layer</subject><subject>Self-assembly</subject><subject>Silicon</subject><subject>Silicon substrates</subject><subject>Sintering</subject><subject>Solar cells</subject><subject>Structural analysis</subject><subject>Substrates</subject><subject>Tin</subject><issn>0925-8388</issn><issn>1873-4669</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNqFkNFqHCEUhqU00G2SRwgIvZ7pcZxx9KqE0KaBQG7aa1HnDOvgrFN1U_Yd-tB12dDb3nhAv_8_-BFyx6BlwMTnpV1MCC6ubQdMtjC0IMU7smNy5E0vhHpPdqC6oZFcyg_kY84LADDF2Y78uS9rzNsek3e15ESzPxRMOFEXtw1TY01GWl_iiZptC5UqPh7o7MNKf_uypxnD3JiccbWhxqxJyWOiwZzqWcnsa-g8jzaXZArSOaZ_t9s-lvgaQzHe5RtyNZuQ8fZtXpOf377-ePjePL88Pj3cPzeOj31pRI-TFYPCTozccBBsHpUbnbDSsgmM5cD7XjF0cuDdJCujrJwszhLVKCS_Jp8uvVuKv46Yi17iMR3qSt2BgoErUEOlhgvlUsw54ay35FeTTpqBPovXi34Tr8_iNQy6iq-5L5cc1i-8Vhc6O48Hh5NP6Iqeov9Pw18vyZMC</recordid><startdate>20180815</startdate><enddate>20180815</enddate><creator>Adachi, Shuichiro</creator><creator>Nojiri, Takeshi</creator><creator>Kato, Takahiko</creator><creator>Watanabe, Seiichi</creator><creator>Yoshida, Masato</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20180815</creationdate><title>Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics</title><author>Adachi, Shuichiro ; Nojiri, Takeshi ; Kato, Takahiko ; Watanabe, Seiichi ; Yoshida, Masato</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c374t-64edb659e2673a3061f79c7c6b8b1d0ab3034491ec8532d83a39b8dbef8e97683</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Atmosphere</topic><topic>Barrier layers</topic><topic>Copper</topic><topic>Copper alloys</topic><topic>Copper base alloys</topic><topic>Crystal structure</topic><topic>Crystallinity</topic><topic>Diffusion barriers</topic><topic>Diffusion layers</topic><topic>Electrode materials</topic><topic>Electrodes</topic><topic>Mass production</topic><topic>Pastes</topic><topic>Photovoltaic cells</topic><topic>Self-assembled barrier layer</topic><topic>Self-assembly</topic><topic>Silicon</topic><topic>Silicon substrates</topic><topic>Sintering</topic><topic>Solar cells</topic><topic>Structural analysis</topic><topic>Substrates</topic><topic>Tin</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Adachi, Shuichiro</creatorcontrib><creatorcontrib>Nojiri, Takeshi</creatorcontrib><creatorcontrib>Kato, Takahiko</creatorcontrib><creatorcontrib>Watanabe, Seiichi</creatorcontrib><creatorcontrib>Yoshida, Masato</creatorcontrib><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of alloys and compounds</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Adachi, Shuichiro</au><au>Nojiri, Takeshi</au><au>Kato, Takahiko</au><au>Watanabe, Seiichi</au><au>Yoshida, Masato</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics</atitle><jtitle>Journal of alloys and compounds</jtitle><date>2018-08-15</date><risdate>2018</risdate><volume>757</volume><spage>333</spage><epage>339</epage><pages>333-339</pages><issn>0925-8388</issn><eissn>1873-4669</eissn><abstract>In this paper, we show the first production of Cu-based electrode materials including self-assembled barrier layers which can prevent Cu-Si inter-diffusion during sintering and are expected to be applicable to crystalline Si photovoltaics. The characteristics of electrodes produced by mixed Cu-P/Sn pastes at various compositions were evaluated. Electrodes sintered in an atmospheric environment showed electrical resistivity of below 1 × 10−4 Ω・cm. In addition, the formation of compounds such as Cu3Si at the Si surface was prevented with a Sn particle ratio ranging between 20 and 60 wt%. The structural analysis revealed that the electrode included not only a Cu-Sn IMCs network but also a self-assembled Sn-P-O glass phase between the Cu-Sn IMCs network and the Si substrate, capable of forming a barrier layer to prevent Cu-Si inter-diffusion. These results may enable the widespread use of atmospherically sintered Cu-based electrode for the mass production of next-generation crystalline Si solar cells. Subsequently, the manner in which the Sn-P-O glasses were formed was discussed using a thermos-dynamical approach.
[Display omitted]
•Cu-based electrodes applicable to the forming on Si substrate were reported.•The electrode paste includes Cu-P alloy and Sn particles.•Cu-P + Sn electrodes had no Cu-Si compounds at the Si surface.•A self-assembled Sn-P-O glass phase can prevent Cu-Si inter-diffusion.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.jallcom.2018.05.086</doi><tpages>7</tpages></addata></record> |
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subjects | Atmosphere Barrier layers Copper Copper alloys Copper base alloys Crystal structure Crystallinity Diffusion barriers Diffusion layers Electrode materials Electrodes Mass production Pastes Photovoltaic cells Self-assembled barrier layer Self-assembly Silicon Silicon substrates Sintering Solar cells Structural analysis Substrates Tin |
title | Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics |
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