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Direct synthesis of magnetron sputtered nanostructured Cu films with desired properties via plasma chemistry for their efficient antibacterial application

By changing the power density, the microstructure, surface morphology, surface energy, and electrical conductivity of the magnetron sputtered Cu films are tuned at a fixed Cu atomic content and the amount of Cu ion release. Data reveals that films with good crystallinity, low surface roughness, mini...

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Bibliographic Details
Published in:Plasma processes and polymers 2018-09, Vol.15 (9), p.n/a
Main Authors: Kim, Hye Ran, Sahu, Bibhuti Bhusan, Xiang, Piao Jin, Han, Jeon Geon
Format: Article
Language:English
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Summary:By changing the power density, the microstructure, surface morphology, surface energy, and electrical conductivity of the magnetron sputtered Cu films are tuned at a fixed Cu atomic content and the amount of Cu ion release. Data reveals that films with good crystallinity, low surface roughness, minimum surface energy, and the lowest electrical resistivity have shown a strong antibacterial response of Gram‐positive bacteria Staphylococcus aureus up to 90–96%. The correlation between the plasma chemistry and film properties is established to investigate the optimized film properties. A possible mechanism is hypothesized to elucidate the observed antibacterial property from the viewpoint of charge transfer. Design, analysis, and investigation of nanostructured Cu films as effective bio materials for antibacterial application and the possible mechanism of antibacterial activity are reported.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.201800009