Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography

We present a method for improving the lithographic resolution of digital micromirror devices for flow-lithography using a wobulation technique. While maintaining the area of UV exposure, the lithographic resolution was improved using a wobulation technique, which is a large screen display technique...

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Bibliographic Details
Published in:Applied physics letters 2016-12, Vol.109 (23)
Main Authors: Kim, Kibeom, Han, Sangkwon, Yoon, Jinsik, Kwon, Sunghoon, Park, Hun-Kuk, Park, Wook
Format: Article
Language:English
Subjects:
Applied physics
Lithography
Microstructure
Pixels
Surface roughness
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Summary:We present a method for improving the lithographic resolution of digital micromirror devices for flow-lithography using a wobulation technique. While maintaining the area of UV exposure, the lithographic resolution was improved using a wobulation technique, which is a large screen display technique that enhances resolution via overlapping pixels by half a pixel. The edges of a diagonal pattern in a microstructure were smoothly generated with additional sub-patterns compared to conventional single pattern-exposure. In addition, the surface roughness of the microstructure was improved because the gaps between pixels were filled by the overlapping patterns.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4967373