Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation

• Published in: Physics of plasmas 2016-03, Vol.23 (3)
• Main Authors: Khoram, M., Ghomi, H., Navab Safa, N.
• Format: Article
• Language: English
• Subjects: 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; BOUNDARY CONDITIONS; Collision dynamics; Collision rates; CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; DIAGRAMS; Dynamic characteristics; ELECTRIC POTENTIAL; FINITE DIFFERENCE METHOD; Gas pressure; High voltages; Ion impact; ION IMPLANTATION; ION TEMPERATURE; IONS; Low voltage; Nonlinear equations; NONLINEAR PROBLEMS; Plasma; Plasma physics; PLASMA SHEATH; Plasma sheaths; PRESSURE DEPENDENCE; Pressure effects; Submerging; Two fluid models
• ISSN: 1070-664X; 1089-7674
• DOI: 10.1063/1.4944503

Here, a collisional magnetized plasma with finite ion temperature is considered to examine the effects of the ion temperature and gas pressure on the plasma-sheath dynamics. We use the two-fluid model of plasma-sheath where the nonlinear equations of a dynamic sheath are solved using a full implicit scheme of finite difference method along with some convenient initial and boundary conditions at the plasma center and target. It is found that the ion temperature only has a significant effect on the characteristics of low voltage sheath, while the gas pressure (collision rate) seriously affects the dynamic characteristics of the low and high voltage plasma-sheath. One can see, increasing the ion temperature in low voltage plasma-sheath causes to increase the temporal curve of the ion dose and the ion impact energy on the target, reduces the temporal curve of the sheath width, and has no any effect on the temporal curve of the ion incident angle on the target. However, rising the gas pressure in low and high voltage plasma-sheath reduces all of these temporal curves.