Venting temperature determines surface chemistry of magnetron sputtered TiN films

Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the...

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Bibliographic Details
Published in:Applied physics letters 2016-01, Vol.108 (4), p.041603
Main Authors: Greczynski, G., Mráz, S., Hultman, L., Schneider, J. M.
Format: Article
Language:English
Subjects:
Applied physics
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
Composition effects
Magnetic properties
Magnetron sputtering
MAGNETRONS
MATERIALS
MATERIALS SCIENCE
Metal nitrides
Organic chemistry
Oxidation resistance
REFRACTORIES
SPUTTERING
Surface chemistry
Surface layers
Surface properties
SURFACES
THIN FILMS
Titanium nitride
TITANIUM NITRIDES
TRANSITION ELEMENTS
Transition metals
X-RAY PHOTOELECTRON SPECTROSCOPY
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Summary:Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature Tv , each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that Tv has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.
ISSN:0003-6951
1077-3118
1077-3118
DOI:10.1063/1.4940974