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Epitaxial graphene thermistor for cryogenic temperatures
•Desorption/adsorption of atmospheric adsorbates influence the electrical conductivity and thermal sensitivity of graphene.•SiO2 encapsulated epitaxial graphene exhibits a strong NTC type thermistor behavior.•Transient thermal response of encapsulated epitaxial graphene is superior for the temperatu...
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Published in: | Sensors and actuators. A. Physical. 2018-09, Vol.280, p.8-13 |
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container_title | Sensors and actuators. A. Physical. |
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creator | Kalkan, Sırrı Batuhan Yiğen, Serap Çelebi, Cem |
description | •Desorption/adsorption of atmospheric adsorbates influence the electrical conductivity and thermal sensitivity of graphene.•SiO2 encapsulated epitaxial graphene exhibits a strong NTC type thermistor behavior.•Transient thermal response of encapsulated epitaxial graphene is superior for the temperatures below 225 K.•SiO2 encapsulated epitaxial graphene can be used readily as a thermistor element for cryogenic temperature measurements.
The thermal responsivity of monolayer epitaxial graphene grown on the Si-face surface of semi-insulating SiC substrate is investigated as a function of temperature below 300 K. The measurements showed that adsorption/desorption of atmospheric adsorbates can randomly modify the electrical characteristics of graphene which is indeed undesirable for consistent temperature sensing operations. Therefore, in order to avoid the interaction between graphene layer and adsorbates, the grown graphene layer is encapsulated with a thin SiO2 film deposited by Pulsed Electron Deposition technique. Temperature dependent resistance measurement of encapsulated graphene exhibited a clear thermistor type behavior with negative temperature coefficient resistance character. Both the sensitivity and transient thermal responsivity of the SiO2/graphene/SiC sample were found to be enhanced greatly especially for the temperatures lower than 225 K. The experimentally obtained results suggest that SiO2 encapsulated epitaxial graphene on SiC can be used readily as an energy efficient and stable temperature sensing element in cryogenic applications. |
doi_str_mv | 10.1016/j.sna.2018.07.028 |
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The thermal responsivity of monolayer epitaxial graphene grown on the Si-face surface of semi-insulating SiC substrate is investigated as a function of temperature below 300 K. The measurements showed that adsorption/desorption of atmospheric adsorbates can randomly modify the electrical characteristics of graphene which is indeed undesirable for consistent temperature sensing operations. Therefore, in order to avoid the interaction between graphene layer and adsorbates, the grown graphene layer is encapsulated with a thin SiO2 film deposited by Pulsed Electron Deposition technique. Temperature dependent resistance measurement of encapsulated graphene exhibited a clear thermistor type behavior with negative temperature coefficient resistance character. Both the sensitivity and transient thermal responsivity of the SiO2/graphene/SiC sample were found to be enhanced greatly especially for the temperatures lower than 225 K. The experimentally obtained results suggest that SiO2 encapsulated epitaxial graphene on SiC can be used readily as an energy efficient and stable temperature sensing element in cryogenic applications.</description><identifier>ISSN: 0924-4247</identifier><identifier>EISSN: 1873-3069</identifier><identifier>DOI: 10.1016/j.sna.2018.07.028</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Adsorbates ; Atomic layer epitaxy ; Cryogenic temperature ; Desorption ; Encapsulation ; Epitaxial graphene ; Epitaxial growth ; Graphene ; Insulation ; Low temperature physics ; Low-temperature ; NTC thermistor ; Sensitivity analysis ; Silicon carbide ; Silicon substrates ; Temperature dependence ; Thermistors</subject><ispartof>Sensors and actuators. A. Physical., 2018-09, Vol.280, p.8-13</ispartof><rights>2018 Elsevier B.V.</rights><rights>Copyright Elsevier BV Sep 1, 2018</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c405t-67517406e26c28af5ec1021ac4da260de05227089cac0813804ddbc00040cf723</citedby><cites>FETCH-LOGICAL-c405t-67517406e26c28af5ec1021ac4da260de05227089cac0813804ddbc00040cf723</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Kalkan, Sırrı Batuhan</creatorcontrib><creatorcontrib>Yiğen, Serap</creatorcontrib><creatorcontrib>Çelebi, Cem</creatorcontrib><title>Epitaxial graphene thermistor for cryogenic temperatures</title><title>Sensors and actuators. A. Physical.</title><description>•Desorption/adsorption of atmospheric adsorbates influence the electrical conductivity and thermal sensitivity of graphene.•SiO2 encapsulated epitaxial graphene exhibits a strong NTC type thermistor behavior.•Transient thermal response of encapsulated epitaxial graphene is superior for the temperatures below 225 K.•SiO2 encapsulated epitaxial graphene can be used readily as a thermistor element for cryogenic temperature measurements.
The thermal responsivity of monolayer epitaxial graphene grown on the Si-face surface of semi-insulating SiC substrate is investigated as a function of temperature below 300 K. The measurements showed that adsorption/desorption of atmospheric adsorbates can randomly modify the electrical characteristics of graphene which is indeed undesirable for consistent temperature sensing operations. Therefore, in order to avoid the interaction between graphene layer and adsorbates, the grown graphene layer is encapsulated with a thin SiO2 film deposited by Pulsed Electron Deposition technique. Temperature dependent resistance measurement of encapsulated graphene exhibited a clear thermistor type behavior with negative temperature coefficient resistance character. Both the sensitivity and transient thermal responsivity of the SiO2/graphene/SiC sample were found to be enhanced greatly especially for the temperatures lower than 225 K. The experimentally obtained results suggest that SiO2 encapsulated epitaxial graphene on SiC can be used readily as an energy efficient and stable temperature sensing element in cryogenic applications.</description><subject>Adsorbates</subject><subject>Atomic layer epitaxy</subject><subject>Cryogenic temperature</subject><subject>Desorption</subject><subject>Encapsulation</subject><subject>Epitaxial graphene</subject><subject>Epitaxial growth</subject><subject>Graphene</subject><subject>Insulation</subject><subject>Low temperature physics</subject><subject>Low-temperature</subject><subject>NTC thermistor</subject><subject>Sensitivity analysis</subject><subject>Silicon carbide</subject><subject>Silicon substrates</subject><subject>Temperature dependence</subject><subject>Thermistors</subject><issn>0924-4247</issn><issn>1873-3069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNp9kMtOwzAQRS0EEqXwAewisU4YP2K7YoWq8pAqsYG1ZZxJ66hNgu0g-ve4KmsWo9ncM3N1CLmlUFGg8r6rYm8rBlRXoCpg-ozMqFa85CAX52QGCyZKwYS6JFcxdgDAuVIzolejT_bH212xCXbcYo9F2mLY-5iGULR5XDgMG-y9KxLuRww2TQHjNblo7S7izd-ek4-n1fvypVy_Pb8uH9elE1CnUqqaKgESmXRM27ZGR4FR60RjmYQGoWZMgV4460BTrkE0zafL_QS4VjE-J3enu2MYviaMyXTDFPr80jDKhJBc18cUPaVcGGIM2Jox-L0NB0PBHAWZzmRB5ijIgDJZUGYeTgzm-t8eg4nOY--w8QFdMs3g_6F_ASDJbTI</recordid><startdate>20180901</startdate><enddate>20180901</enddate><creator>Kalkan, Sırrı Batuhan</creator><creator>Yiğen, Serap</creator><creator>Çelebi, Cem</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope></search><sort><creationdate>20180901</creationdate><title>Epitaxial graphene thermistor for cryogenic temperatures</title><author>Kalkan, Sırrı Batuhan ; Yiğen, Serap ; Çelebi, Cem</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c405t-67517406e26c28af5ec1021ac4da260de05227089cac0813804ddbc00040cf723</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Adsorbates</topic><topic>Atomic layer epitaxy</topic><topic>Cryogenic temperature</topic><topic>Desorption</topic><topic>Encapsulation</topic><topic>Epitaxial graphene</topic><topic>Epitaxial growth</topic><topic>Graphene</topic><topic>Insulation</topic><topic>Low temperature physics</topic><topic>Low-temperature</topic><topic>NTC thermistor</topic><topic>Sensitivity analysis</topic><topic>Silicon carbide</topic><topic>Silicon substrates</topic><topic>Temperature dependence</topic><topic>Thermistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kalkan, Sırrı Batuhan</creatorcontrib><creatorcontrib>Yiğen, Serap</creatorcontrib><creatorcontrib>Çelebi, Cem</creatorcontrib><collection>CrossRef</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Sensors and actuators. A. Physical.</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kalkan, Sırrı Batuhan</au><au>Yiğen, Serap</au><au>Çelebi, Cem</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Epitaxial graphene thermistor for cryogenic temperatures</atitle><jtitle>Sensors and actuators. A. Physical.</jtitle><date>2018-09-01</date><risdate>2018</risdate><volume>280</volume><spage>8</spage><epage>13</epage><pages>8-13</pages><issn>0924-4247</issn><eissn>1873-3069</eissn><abstract>•Desorption/adsorption of atmospheric adsorbates influence the electrical conductivity and thermal sensitivity of graphene.•SiO2 encapsulated epitaxial graphene exhibits a strong NTC type thermistor behavior.•Transient thermal response of encapsulated epitaxial graphene is superior for the temperatures below 225 K.•SiO2 encapsulated epitaxial graphene can be used readily as a thermistor element for cryogenic temperature measurements.
The thermal responsivity of monolayer epitaxial graphene grown on the Si-face surface of semi-insulating SiC substrate is investigated as a function of temperature below 300 K. The measurements showed that adsorption/desorption of atmospheric adsorbates can randomly modify the electrical characteristics of graphene which is indeed undesirable for consistent temperature sensing operations. Therefore, in order to avoid the interaction between graphene layer and adsorbates, the grown graphene layer is encapsulated with a thin SiO2 film deposited by Pulsed Electron Deposition technique. Temperature dependent resistance measurement of encapsulated graphene exhibited a clear thermistor type behavior with negative temperature coefficient resistance character. Both the sensitivity and transient thermal responsivity of the SiO2/graphene/SiC sample were found to be enhanced greatly especially for the temperatures lower than 225 K. The experimentally obtained results suggest that SiO2 encapsulated epitaxial graphene on SiC can be used readily as an energy efficient and stable temperature sensing element in cryogenic applications.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.sna.2018.07.028</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Adsorbates Atomic layer epitaxy Cryogenic temperature Desorption Encapsulation Epitaxial graphene Epitaxial growth Graphene Insulation Low temperature physics Low-temperature NTC thermistor Sensitivity analysis Silicon carbide Silicon substrates Temperature dependence Thermistors |
title | Epitaxial graphene thermistor for cryogenic temperatures |
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