Comparison between absolute densities of metastable state and ground state of atoms in CZTS sputtering plasmas

Absorption spectroscopy technique was used to measure the densities of sputtered atoms in the ground state and metastable state in pulse-modulated sputtering plasmas with compound Cu2ZnSnS4(CZTS) target. At a fixed discharge power, the absolute metastable densities of sputtered Cu, Zn, and Sn atoms...

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Bibliographic Details
Main Authors: Nayan, Nafarizal, Sasaki, Koichi
Format: Conference Proceeding
Language:English
Subjects:
Argon
Copper
Film growth
Ground state
Helium
Metastable atoms
Metastable state
Plasma
Plasma density
Plasmas
Sputtering
Thin films
Tin
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Summary:Absorption spectroscopy technique was used to measure the densities of sputtered atoms in the ground state and metastable state in pulse-modulated sputtering plasmas with compound Cu2ZnSnS4(CZTS) target. At a fixed discharge power, the absolute metastable densities of sputtered Cu, Zn, and Sn atoms increased with the argon pressure. This characteristic is believed due to the enhancement of plasma density with increasing argon pressure, which would increase the excitation rate of sputtered atoms. In addition, the metastable state densities of sputtered atoms are equal or higher than that of the ground state densities. Therefore, these experimental results reveal that the contribution of metastable atoms should be taken into account during the calculation and simulation of thin film growth via sputtering plasmas.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.4968386