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Facile fabrication of a ultraviolet tunable MoS2/ p -Si junction diode
Chemical vapor deposition grown MoS2 single crystals were transferred onto the edge of a p-Si/SiO2 wafer, forming an abrupt heterogeneous junction diode at the MoS2/p-Si interface. When electrically characterized as a field effect transistor, MoS2 exhibits an n-type response and can be doped in the...
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Published in: | Applied physics letters 2015-05, Vol.106 (19) |
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container_title | Applied physics letters |
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creator | Serrano, William Pinto, Nicholas J. Naylor, Carl H. Kybert, Nicholas J. Johnson, A. T. Charlie |
description | Chemical vapor deposition grown MoS2 single crystals were transferred onto the edge of a p-Si/SiO2 wafer, forming an abrupt heterogeneous junction diode at the MoS2/p-Si interface. When electrically characterized as a field effect transistor, MoS2 exhibits an n-type response and can be doped in the presence of ultraviolet (UV) light. As a diode, it operates satisfactorily in air, but has higher currents in vacuum with a turn on voltage of ∼1.3 V and an on/off ratio of 20 at ±2 V. UV irradiation increases the diode on state current, decreases the turn-on voltage, and reduces the ideality parameter below 2. These changes are reversible after annealing in air as desorption of electron trapping species like O2− and H2O− are believed responsible for this effect. A circuit integrating this diode was used to rectify a 1 kHz signal with an efficiency of 12%. Its simple design, coupled with the ability to clip AC signals, sense UV light, and reversibly tune these diodes, makes them inexpensive, multifunctional, and usable as active or passive circuit components in complex electronics. |
doi_str_mv | 10.1063/1.4921238 |
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T. Charlie</creator><creatorcontrib>Serrano, William ; Pinto, Nicholas J. ; Naylor, Carl H. ; Kybert, Nicholas J. ; Johnson, A. T. Charlie</creatorcontrib><description>Chemical vapor deposition grown MoS2 single crystals were transferred onto the edge of a p-Si/SiO2 wafer, forming an abrupt heterogeneous junction diode at the MoS2/p-Si interface. When electrically characterized as a field effect transistor, MoS2 exhibits an n-type response and can be doped in the presence of ultraviolet (UV) light. As a diode, it operates satisfactorily in air, but has higher currents in vacuum with a turn on voltage of ∼1.3 V and an on/off ratio of 20 at ±2 V. UV irradiation increases the diode on state current, decreases the turn-on voltage, and reduces the ideality parameter below 2. These changes are reversible after annealing in air as desorption of electron trapping species like O2− and H2O− are believed responsible for this effect. A circuit integrating this diode was used to rectify a 1 kHz signal with an efficiency of 12%. 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T. Charlie</creatorcontrib><title>Facile fabrication of a ultraviolet tunable MoS2/ p -Si junction diode</title><title>Applied physics letters</title><description>Chemical vapor deposition grown MoS2 single crystals were transferred onto the edge of a p-Si/SiO2 wafer, forming an abrupt heterogeneous junction diode at the MoS2/p-Si interface. When electrically characterized as a field effect transistor, MoS2 exhibits an n-type response and can be doped in the presence of ultraviolet (UV) light. As a diode, it operates satisfactorily in air, but has higher currents in vacuum with a turn on voltage of ∼1.3 V and an on/off ratio of 20 at ±2 V. UV irradiation increases the diode on state current, decreases the turn-on voltage, and reduces the ideality parameter below 2. These changes are reversible after annealing in air as desorption of electron trapping species like O2− and H2O− are believed responsible for this effect. A circuit integrating this diode was used to rectify a 1 kHz signal with an efficiency of 12%. Its simple design, coupled with the ability to clip AC signals, sense UV light, and reversibly tune these diodes, makes them inexpensive, multifunctional, and usable as active or passive circuit components in complex electronics.</description><subject>Applied physics</subject><subject>Chemical vapor deposition</subject><subject>Crystal growth</subject><subject>Diodes</subject><subject>Electric potential</subject><subject>Field effect transistors</subject><subject>Junction diodes</subject><subject>Molybdenum disulfide</subject><subject>Organic chemistry</subject><subject>Semiconductor devices</subject><subject>Silicon dioxide</subject><subject>Single crystals</subject><subject>Ultraviolet radiation</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNotkEFLxDAQhYMoWFcP_oOAJw_dzSRNkx5lcVVY8bB7D0maQkptapoK_nuju5eZefAxj_cQugeyBlKzDayrhgJl8gIVQIQoGYC8RAUhhJV1w-Ea3cxznyWnjBVot9PWDw532kRvdfJhxKHDGi9Divrbh8ElnJZRmwy9hwPd4AmXB4_7ZbT_dOtD627RVaeH2d2d9wodd8_H7Wu5_3h52z7tS0u5SKXQ3HAhReUkkdrk6RrKWmM7WQlHeMOEpZ0Fy8BqIalsjdHAaJ0vbgVboYfT2ymGr8XNSfVhiWN2VDl0JbikTZOpxxNlY5jn6Do1Rf-p448Cov5aUqDOLbFfRWtXfw</recordid><startdate>20150511</startdate><enddate>20150511</enddate><creator>Serrano, William</creator><creator>Pinto, Nicholas J.</creator><creator>Naylor, Carl H.</creator><creator>Kybert, Nicholas J.</creator><creator>Johnson, A. T. Charlie</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-5402-1224</orcidid></search><sort><creationdate>20150511</creationdate><title>Facile fabrication of a ultraviolet tunable MoS2/ p -Si junction diode</title><author>Serrano, William ; Pinto, Nicholas J. ; Naylor, Carl H. ; Kybert, Nicholas J. ; Johnson, A. T. Charlie</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c257t-7a5b57874e808abe80e923dbcf847e05937c2fc1c31ca7828dbba132628d5c73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Applied physics</topic><topic>Chemical vapor deposition</topic><topic>Crystal growth</topic><topic>Diodes</topic><topic>Electric potential</topic><topic>Field effect transistors</topic><topic>Junction diodes</topic><topic>Molybdenum disulfide</topic><topic>Organic chemistry</topic><topic>Semiconductor devices</topic><topic>Silicon dioxide</topic><topic>Single crystals</topic><topic>Ultraviolet radiation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Serrano, William</creatorcontrib><creatorcontrib>Pinto, Nicholas J.</creatorcontrib><creatorcontrib>Naylor, Carl H.</creatorcontrib><creatorcontrib>Kybert, Nicholas J.</creatorcontrib><creatorcontrib>Johnson, A. 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Charlie</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Facile fabrication of a ultraviolet tunable MoS2/ p -Si junction diode</atitle><jtitle>Applied physics letters</jtitle><date>2015-05-11</date><risdate>2015</risdate><volume>106</volume><issue>19</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>Chemical vapor deposition grown MoS2 single crystals were transferred onto the edge of a p-Si/SiO2 wafer, forming an abrupt heterogeneous junction diode at the MoS2/p-Si interface. When electrically characterized as a field effect transistor, MoS2 exhibits an n-type response and can be doped in the presence of ultraviolet (UV) light. As a diode, it operates satisfactorily in air, but has higher currents in vacuum with a turn on voltage of ∼1.3 V and an on/off ratio of 20 at ±2 V. UV irradiation increases the diode on state current, decreases the turn-on voltage, and reduces the ideality parameter below 2. 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source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); AIP Journals (American Institute of Physics) |
subjects | Applied physics Chemical vapor deposition Crystal growth Diodes Electric potential Field effect transistors Junction diodes Molybdenum disulfide Organic chemistry Semiconductor devices Silicon dioxide Single crystals Ultraviolet radiation |
title | Facile fabrication of a ultraviolet tunable MoS2/ p -Si junction diode |
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