Wide bandgap engineering of (AlGa)2O3 films

Bandgap tunable (AlGa)2O3 films were deposited on sapphire substrates by pulsed laser deposition (PLD). The deposited films are of high transmittance as measured by spectrophotometer. The Al content in films is almost the same as that in targets. The measurement of bandgap energies by examining the...

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Bibliographic Details
Published in:Applied physics letters 2014-10, Vol.105 (16)
Main Authors: Zhang, Fabi, Saito, Katsuhiko, Tanaka, Tooru, Nishio, Mitsuhiro, Arita, Makoto, Guo, Qixin
Format: Article
Language:English
Subjects:
Aluminum
Applied physics
Atomic spectra
Core loss
Energy dissipation
Energy gap
Pulsed laser deposition
Pulsed lasers
Sapphire
Spectrum analysis
Substrates
Transmittance
X ray spectra
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Summary:Bandgap tunable (AlGa)2O3 films were deposited on sapphire substrates by pulsed laser deposition (PLD). The deposited films are of high transmittance as measured by spectrophotometer. The Al content in films is almost the same as that in targets. The measurement of bandgap energies by examining the onset of inelastic energy loss in core-level atomic spectra using X-ray photoelectron spectroscopy is proved to be valid for determining the bandgap of (AlGa)2O3 films as it is in good agreement with the bandgap values from transmittance spectra. The measured bandgap of (AlGa)2O3 films increases continuously with the Al content covering the whole Al content range from about 5 to 7 eV, indicating PLD is a promising growth technology for growing bandgap tunable (AlGa)2O3 films.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4900522