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Ammonia Sensing Characteristics of a Tungsten Trioxide Thin-Film-Based Sensor
A tungsten trioxide (WO 3 ) thin-film-based ammonia sensor device prepared using radio frequency sputtering is reported and studied. A very thin WO 3 film (~10 nm) is employed in the studied device. Experimentally, the studied device exhibits a high ammonia sensing response of 13.7 (at 1000-ppm NH 3...
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Published in: | IEEE transactions on electron devices 2019-01, Vol.66 (1), p.696-701 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A tungsten trioxide (WO 3 ) thin-film-based ammonia sensor device prepared using radio frequency sputtering is reported and studied. A very thin WO 3 film (~10 nm) is employed in the studied device. Experimentally, the studied device exhibits a high ammonia sensing response of 13.7 (at 1000-ppm NH 3 /air, 250 °C), an extremely low detection level (≤10-ppb NH 3 /air, 250 °C), a relatively low optimal operating temperature of 250 °C, and a widespread sensing concentration range. Furthermore, the device shows advantages including a simple structure, easy fabrication, and relatively lower operating temperature (≤250 °C). Thus, the proposed WO 3 thin-film-based sensor device is promising for high-performance ammonia sensing applications. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2018.2882737 |