Crystal Morphology of Mesoporous Silica Thin Films Synthesized by the Spin-Coating Method Using PEO-PPO-PEO Triblock Copolymer

Mesoporous thin films on Si substrates with thicknesses of about 460–610 nm have been synthesized by the spin‐coating method using a Pluronic EO77PO29EO77 (F68), EO104PO39EO104 (F88), and EO133PO50EO133 (F108) triblock copolymer system. The triblock copolymers were preserved within the synthesized m...

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Bibliographic Details
Published in:Journal of the American Ceramic Society 2002-10, Vol.85 (10), p.2542-2544
Main Authors: Park, Gyeong-Su, Ahn, Chi-Won, Kim, Mahn-Won
Format: Article
Language:English
Subjects:
Chemistry
Colloidal state and disperse state
Cross-disciplinary physics: materials science
rheology
crystals/crystallization
Disperse systems
Exact sciences and technology
General and physical chemistry
Liquid phase epitaxy
deposition from liquid phases (melts, solutions, and surface layers on liquids)
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Porous materials
silica
thin films
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Summary:Mesoporous thin films on Si substrates with thicknesses of about 460–610 nm have been synthesized by the spin‐coating method using a Pluronic EO77PO29EO77 (F68), EO104PO39EO104 (F88), and EO133PO50EO133 (F108) triblock copolymer system. The triblock copolymers were preserved within the synthesized mesoporous thin films. Transmission electron microscopy (TEM) characterization of these films clearly demonstrates that long‐range mesostructural ordering strongly depends on the molecular weight of the poly(ethylene oxide)–poly(propylene oxide)–poly(ethylene oxide) (PEO–PPO–PEO) triblock copolymer, with lower molecular weight producing higher degrees of order. Plane and cross‐sectional high‐resolution TEM studies coupled with X‐ray diffraction (XRD) analysis also show that highly ordered F68 mesoporous silica thin film forms a cubic structure with a lattice spacing a= 6.70 nm.
ISSN:0002-7820
1551-2916
DOI:10.1111/j.1151-2916.2002.tb00492.x