Fast self-assembly of polystyrene- b -poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications

The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene- block -poly(pentadecafluorooctyl methacrylate) (PS- b -PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is...

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Bibliographic Details
Published in:Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2019, Vol.7 (9), p.2535-2540
Main Authors: Li, Xuemiao, Li, Jie, Wang, Chenxu, Liu, Yuyun, Deng, Hai
Format: Article
Language:English
Subjects:
Anionic polymerization
Block copolymers
Chemical synthesis
Incompatibility
Interaction parameters
Perfluoroalkyl & polyfluoroalkyl substances
Polystyrene resins
Self-assembly
Small angle X ray scattering
Transmission electron microscopy
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Summary:The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene- block -poly(pentadecafluorooctyl methacrylate) (PS- b -PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is investigated using small-angle X-ray scattering and transmission electron microscopy. The resulting BCP materials form sub-5 nm features after 1 min of thermal annealing at 80 °C. The Flory–Huggins interaction parameter of PS- b -PPDFMA is very large (0.353 at 150 °C) because of the significant incompatibility between polystyrene and the perfluoroalkyl block. These results qualify PS- b -PPDFMA as a potential material for sub-5 nm patterning applications.
ISSN:2050-7526
2050-7534
DOI:10.1039/C8TC06480F