Fast self-assembly of polystyrene- b -poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications

The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene- block -poly(pentadecafluorooctyl methacrylate) (PS- b -PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is...

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Published in:Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2019, Vol.7 (9), p.2535-2540
Main Authors: Li, Xuemiao, Li, Jie, Wang, Chenxu, Liu, Yuyun, Deng, Hai
Format: Article
Language:English
Subjects:
Anionic polymerization
Block copolymers
Chemical synthesis
Incompatibility
Interaction parameters
Perfluoroalkyl & polyfluoroalkyl substances
Polystyrene resins
Self-assembly
Small angle X ray scattering
Transmission electron microscopy
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cited_by cdi_FETCH-LOGICAL-c259t-b6cf513da7322044368ed2feb455df447a140cfa4ab0a321c095bff79bb9ff793
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container_end_page 2540
container_issue 9
container_start_page 2535
container_title Journal of materials chemistry. C, Materials for optical and electronic devices
container_volume 7
creator Li, Xuemiao
Li, Jie
Wang, Chenxu
Liu, Yuyun
Deng, Hai
description The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene- block -poly(pentadecafluorooctyl methacrylate) (PS- b -PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is investigated using small-angle X-ray scattering and transmission electron microscopy. The resulting BCP materials form sub-5 nm features after 1 min of thermal annealing at 80 °C. The Flory–Huggins interaction parameter of PS- b -PPDFMA is very large (0.353 at 150 °C) because of the significant incompatibility between polystyrene and the perfluoroalkyl block. These results qualify PS- b -PPDFMA as a potential material for sub-5 nm patterning applications.
doi_str_mv 10.1039/C8TC06480F
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2186836664</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2186836664</sourcerecordid><originalsourceid>FETCH-LOGICAL-c259t-b6cf513da7322044368ed2feb455df447a140cfa4ab0a321c095bff79bb9ff793</originalsourceid><addsrcrecordid>eNpFkE9LxDAQxYMouOhe_AQBLypU87_tUYqrwoKX9VwmbaJd2qQm6aF-erus6FzePPgxw3sIXVFyTwkvH6piVxElCrI5QStGJMlyycXp387UOVrHuCfLFFQVqlyh7w3EhKPpbQYxmkH3M_YWj76fY5qDcSbDGmcHf2P7yQePB5M-oQlzD8nc4s4lj-OkM4ndgIeuCb71A3QuYusDduD8CCmZ4Dr3gWEc-66B1HkXL9GZhT6a9a9eoPfN0656ybZvz6_V4zZrmCxTplVjJeUt5JwxIgRXhWmZNVpI2VohcqCCNBYEaAKc0YaUUlubl1qXB-EX6Pp4dwz-azIx1Xs_Bbe8rBktVMGVUmKh7o7UEiDGYGw9hm6AMNeU1Id66_96-Q-8pG7d</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2186836664</pqid></control><display><type>article</type><title>Fast self-assembly of polystyrene- b -poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications</title><source>Royal Society of Chemistry</source><creator>Li, Xuemiao ; Li, Jie ; Wang, Chenxu ; Liu, Yuyun ; Deng, Hai</creator><creatorcontrib>Li, Xuemiao ; Li, Jie ; Wang, Chenxu ; Liu, Yuyun ; Deng, Hai</creatorcontrib><description>The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene- block -poly(pentadecafluorooctyl methacrylate) (PS- b -PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is investigated using small-angle X-ray scattering and transmission electron microscopy. The resulting BCP materials form sub-5 nm features after 1 min of thermal annealing at 80 °C. The Flory–Huggins interaction parameter of PS- b -PPDFMA is very large (0.353 at 150 °C) because of the significant incompatibility between polystyrene and the perfluoroalkyl block. These results qualify PS- b -PPDFMA as a potential material for sub-5 nm patterning applications.</description><identifier>ISSN: 2050-7526</identifier><identifier>EISSN: 2050-7534</identifier><identifier>DOI: 10.1039/C8TC06480F</identifier><language>eng</language><publisher>Cambridge: Royal Society of Chemistry</publisher><subject>Anionic polymerization ; Block copolymers ; Chemical synthesis ; Incompatibility ; Interaction parameters ; Perfluoroalkyl &amp; polyfluoroalkyl substances ; Polystyrene resins ; Self-assembly ; Small angle X ray scattering ; Transmission electron microscopy</subject><ispartof>Journal of materials chemistry. C, Materials for optical and electronic devices, 2019, Vol.7 (9), p.2535-2540</ispartof><rights>Copyright Royal Society of Chemistry 2019</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c259t-b6cf513da7322044368ed2feb455df447a140cfa4ab0a321c095bff79bb9ff793</citedby><cites>FETCH-LOGICAL-c259t-b6cf513da7322044368ed2feb455df447a140cfa4ab0a321c095bff79bb9ff793</cites><orcidid>0000-0002-2086-2172</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,4022,27921,27922,27923</link.rule.ids></links><search><creatorcontrib>Li, Xuemiao</creatorcontrib><creatorcontrib>Li, Jie</creatorcontrib><creatorcontrib>Wang, Chenxu</creatorcontrib><creatorcontrib>Liu, Yuyun</creatorcontrib><creatorcontrib>Deng, Hai</creatorcontrib><title>Fast self-assembly of polystyrene- b -poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications</title><title>Journal of materials chemistry. C, Materials for optical and electronic devices</title><description>The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene- block -poly(pentadecafluorooctyl methacrylate) (PS- b -PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is investigated using small-angle X-ray scattering and transmission electron microscopy. The resulting BCP materials form sub-5 nm features after 1 min of thermal annealing at 80 °C. The Flory–Huggins interaction parameter of PS- b -PPDFMA is very large (0.353 at 150 °C) because of the significant incompatibility between polystyrene and the perfluoroalkyl block. These results qualify PS- b -PPDFMA as a potential material for sub-5 nm patterning applications.</description><subject>Anionic polymerization</subject><subject>Block copolymers</subject><subject>Chemical synthesis</subject><subject>Incompatibility</subject><subject>Interaction parameters</subject><subject>Perfluoroalkyl &amp; polyfluoroalkyl substances</subject><subject>Polystyrene resins</subject><subject>Self-assembly</subject><subject>Small angle X ray scattering</subject><subject>Transmission electron microscopy</subject><issn>2050-7526</issn><issn>2050-7534</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNpFkE9LxDAQxYMouOhe_AQBLypU87_tUYqrwoKX9VwmbaJd2qQm6aF-erus6FzePPgxw3sIXVFyTwkvH6piVxElCrI5QStGJMlyycXp387UOVrHuCfLFFQVqlyh7w3EhKPpbQYxmkH3M_YWj76fY5qDcSbDGmcHf2P7yQePB5M-oQlzD8nc4s4lj-OkM4ndgIeuCb71A3QuYusDduD8CCmZ4Dr3gWEc-66B1HkXL9GZhT6a9a9eoPfN0656ybZvz6_V4zZrmCxTplVjJeUt5JwxIgRXhWmZNVpI2VohcqCCNBYEaAKc0YaUUlubl1qXB-EX6Pp4dwz-azIx1Xs_Bbe8rBktVMGVUmKh7o7UEiDGYGw9hm6AMNeU1Id66_96-Q-8pG7d</recordid><startdate>2019</startdate><enddate>2019</enddate><creator>Li, Xuemiao</creator><creator>Li, Jie</creator><creator>Wang, Chenxu</creator><creator>Liu, Yuyun</creator><creator>Deng, Hai</creator><general>Royal Society of Chemistry</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-2086-2172</orcidid></search><sort><creationdate>2019</creationdate><title>Fast self-assembly of polystyrene- b -poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications</title><author>Li, Xuemiao ; Li, Jie ; Wang, Chenxu ; Liu, Yuyun ; Deng, Hai</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c259t-b6cf513da7322044368ed2feb455df447a140cfa4ab0a321c095bff79bb9ff793</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Anionic polymerization</topic><topic>Block copolymers</topic><topic>Chemical synthesis</topic><topic>Incompatibility</topic><topic>Interaction parameters</topic><topic>Perfluoroalkyl &amp; polyfluoroalkyl substances</topic><topic>Polystyrene resins</topic><topic>Self-assembly</topic><topic>Small angle X ray scattering</topic><topic>Transmission electron microscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Xuemiao</creatorcontrib><creatorcontrib>Li, Jie</creatorcontrib><creatorcontrib>Wang, Chenxu</creatorcontrib><creatorcontrib>Liu, Yuyun</creatorcontrib><creatorcontrib>Deng, Hai</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of materials chemistry. C, Materials for optical and electronic devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Xuemiao</au><au>Li, Jie</au><au>Wang, Chenxu</au><au>Liu, Yuyun</au><au>Deng, Hai</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fast self-assembly of polystyrene- b -poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications</atitle><jtitle>Journal of materials chemistry. C, Materials for optical and electronic devices</jtitle><date>2019</date><risdate>2019</risdate><volume>7</volume><issue>9</issue><spage>2535</spage><epage>2540</epage><pages>2535-2540</pages><issn>2050-7526</issn><eissn>2050-7534</eissn><abstract>The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor lithography. In this paper, a series of polystyrene- block -poly(pentadecafluorooctyl methacrylate) (PS- b -PPDFMA) copolymers are designed and synthesized by living anionic polymerization. The BCP phase behavior is investigated using small-angle X-ray scattering and transmission electron microscopy. The resulting BCP materials form sub-5 nm features after 1 min of thermal annealing at 80 °C. The Flory–Huggins interaction parameter of PS- b -PPDFMA is very large (0.353 at 150 °C) because of the significant incompatibility between polystyrene and the perfluoroalkyl block. These results qualify PS- b -PPDFMA as a potential material for sub-5 nm patterning applications.</abstract><cop>Cambridge</cop><pub>Royal Society of Chemistry</pub><doi>10.1039/C8TC06480F</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-2086-2172</orcidid></addata></record>
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source Royal Society of Chemistry
subjects Anionic polymerization
Block copolymers
Chemical synthesis
Incompatibility
Interaction parameters
Perfluoroalkyl & polyfluoroalkyl substances
Polystyrene resins
Self-assembly
Small angle X ray scattering
Transmission electron microscopy
title Fast self-assembly of polystyrene- b -poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T20%3A03%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Fast%20self-assembly%20of%20polystyrene-%20b%20-poly(fluoro%20methacrylate)%20into%20sub-5%20nm%20microdomains%20for%20nanopatterning%20applications&rft.jtitle=Journal%20of%20materials%20chemistry.%20C,%20Materials%20for%20optical%20and%20electronic%20devices&rft.au=Li,%20Xuemiao&rft.date=2019&rft.volume=7&rft.issue=9&rft.spage=2535&rft.epage=2540&rft.pages=2535-2540&rft.issn=2050-7526&rft.eissn=2050-7534&rft_id=info:doi/10.1039/C8TC06480F&rft_dat=%3Cproquest_cross%3E2186836664%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c259t-b6cf513da7322044368ed2feb455df447a140cfa4ab0a321c095bff79bb9ff793%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2186836664&rft_id=info:pmid/&rfr_iscdi=true