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Selective Ohmic Contact Formation on Schottky Type AlGaN/GaN UV Sensors Using Local Breakdown
Local annealing method was developed to change the Ni-AlGaN/GaN and Ni-GaN rectifying contacts into ohmic contacts by using the dielectric breakdown of a sacrificial insulator. The current increased 10 5 times in an AlGaN/GaN Schottky diode as a result of the annealing step. An interdigitated Schott...
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Published in: | IEEE sensors journal 2019-04, Vol.19 (8), p.2946-2949 |
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description | Local annealing method was developed to change the Ni-AlGaN/GaN and Ni-GaN rectifying contacts into ohmic contacts by using the dielectric breakdown of a sacrificial insulator. The current increased 10 5 times in an AlGaN/GaN Schottky diode as a result of the annealing step. An interdigitated Schottky metal-semiconductor-metal ultraviolet (UV) sensor was fabricated using the locally annealed electrodes. The UV to visible rejection ratio of the GaN-based UV sensor was 5.2 at forward bias to 467.9 at a reverse bias of −1 V. Unlike typical annealing methods, the local annealing method will be useful to change the contact property on the probing stage even after finishing the whole fabrication processes. |
doi_str_mv | 10.1109/JSEN.2019.2892556 |
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The current increased 10 5 times in an AlGaN/GaN Schottky diode as a result of the annealing step. An interdigitated Schottky metal-semiconductor-metal ultraviolet (UV) sensor was fabricated using the locally annealed electrodes. The UV to visible rejection ratio of the GaN-based UV sensor was 5.2 at forward bias to 467.9 at a reverse bias of −1 V. Unlike typical annealing methods, the local annealing method will be useful to change the contact property on the probing stage even after finishing the whole fabrication processes.</description><identifier>ISSN: 1530-437X</identifier><identifier>EISSN: 1558-1748</identifier><identifier>DOI: 10.1109/JSEN.2019.2892556</identifier><identifier>CODEN: ISJEAZ</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>AlGaN ; Aluminum gallium nitride ; Aluminum gallium nitrides ; Annealing ; Bias ; Contact resistance ; Dielectric breakdown ; Diodes ; Electrodes ; Gallium nitride ; Gallium nitrides ; GaN ; local breakdown ; Schottky diodes ; Schottky electrode ; Sensors ; UV photodiode ; Wide band gap semiconductors</subject><ispartof>IEEE sensors journal, 2019-04, Vol.19 (8), p.2946-2949</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. 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Unlike typical annealing methods, the local annealing method will be useful to change the contact property on the probing stage even after finishing the whole fabrication processes.</description><subject>AlGaN</subject><subject>Aluminum gallium nitride</subject><subject>Aluminum gallium nitrides</subject><subject>Annealing</subject><subject>Bias</subject><subject>Contact resistance</subject><subject>Dielectric breakdown</subject><subject>Diodes</subject><subject>Electrodes</subject><subject>Gallium nitride</subject><subject>Gallium nitrides</subject><subject>GaN</subject><subject>local breakdown</subject><subject>Schottky diodes</subject><subject>Schottky electrode</subject><subject>Sensors</subject><subject>UV photodiode</subject><subject>Wide band gap semiconductors</subject><issn>1530-437X</issn><issn>1558-1748</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNo9kFFPwjAQxxujiYh-AONLE58Ha7u22yMSQQ2Bh4HxxTRt18lgrNgWDd_eLRCTu9w9_P53yQ-AexQPEIqz4Vv-PB_gGGUDnGaYUnYBeojSNEI8SS-7ncRRQvjHNbjxfhO3JKe8Bz5zUxsdqh8DF-tdpeHYNkHqACfW7WSobAPbyvXahrA9wuVxb-Consr5sG24eoe5abx1Hq581XzBmdWyhk_OyG1hf5tbcFXK2pu78-yD1eR5OX6JZovp63g0izTOSIh0qVRJlSYJQUxJThmmrCwIR6UuNGWZVoolpOAEF9qkhpVxoThOVSpjTbAmffB4urt39vtgfBAbe3BN-1JglCWIE56lLYVOlHbWe2dKsXfVTrqjQLHoLIrOougsirPFNvNwylTGmH8-ZQghzMgfTlRuUw</recordid><startdate>20190415</startdate><enddate>20190415</enddate><creator>Seol, Jeong-Hoon</creator><creator>Hahm, Sung-Ho</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-1265-5333</orcidid><orcidid>https://orcid.org/0000-0002-0241-1642</orcidid></search><sort><creationdate>20190415</creationdate><title>Selective Ohmic Contact Formation on Schottky Type AlGaN/GaN UV Sensors Using Local Breakdown</title><author>Seol, Jeong-Hoon ; Hahm, Sung-Ho</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c293t-cfbbf5bc34316ba756256fd371fcdc569cbb643d732dce8e6f0db728b8a0c32c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>AlGaN</topic><topic>Aluminum gallium nitride</topic><topic>Aluminum gallium nitrides</topic><topic>Annealing</topic><topic>Bias</topic><topic>Contact resistance</topic><topic>Dielectric breakdown</topic><topic>Diodes</topic><topic>Electrodes</topic><topic>Gallium nitride</topic><topic>Gallium nitrides</topic><topic>GaN</topic><topic>local breakdown</topic><topic>Schottky diodes</topic><topic>Schottky electrode</topic><topic>Sensors</topic><topic>UV photodiode</topic><topic>Wide band gap semiconductors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Seol, Jeong-Hoon</creatorcontrib><creatorcontrib>Hahm, Sung-Ho</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998–Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE sensors journal</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Seol, Jeong-Hoon</au><au>Hahm, Sung-Ho</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Selective Ohmic Contact Formation on Schottky Type AlGaN/GaN UV Sensors Using Local Breakdown</atitle><jtitle>IEEE sensors journal</jtitle><stitle>JSEN</stitle><date>2019-04-15</date><risdate>2019</risdate><volume>19</volume><issue>8</issue><spage>2946</spage><epage>2949</epage><pages>2946-2949</pages><issn>1530-437X</issn><eissn>1558-1748</eissn><coden>ISJEAZ</coden><abstract>Local annealing method was developed to change the Ni-AlGaN/GaN and Ni-GaN rectifying contacts into ohmic contacts by using the dielectric breakdown of a sacrificial insulator. 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subjects | AlGaN Aluminum gallium nitride Aluminum gallium nitrides Annealing Bias Contact resistance Dielectric breakdown Diodes Electrodes Gallium nitride Gallium nitrides GaN local breakdown Schottky diodes Schottky electrode Sensors UV photodiode Wide band gap semiconductors |
title | Selective Ohmic Contact Formation on Schottky Type AlGaN/GaN UV Sensors Using Local Breakdown |
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