Application of the CrossBeam Technology to TEM Sample Preparation and Nanolithography

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

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Bibliographic Details
Published in:Microscopy and microanalysis 2004-08, Vol.10 (S02), p.1152-1153
Main Authors: Gnauck, Peter, Zeile, Ulrike
Format: Article
Language:English
Subjects:
Failure analysis
Focused Ion Beam (FIB) / Dual Beam Applications and Techniques in Biological and Physical Sciences
Ion beams
Microscopy
Real time
Sample preparation
Online Access:Get full text
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Description
Summary:Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.
ISSN:1431-9276
1435-8115
DOI:10.1017/S1431927604884411