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P‐65: Misty Mura Defect of OGM Products Research
The misty mura defect of OGM products seriously affects the product appearance yield. It was found that the misty mura is caused by insufficient adhesion of the photoresist. In this paper, etch and photo process conditions were optimized and verified. We found that extending the metal photo oven tim...
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Published in: | SID International Symposium Digest of technical papers 2019-06, Vol.50 (1), p.1477-1480 |
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creator | Yong-fei, Li Zhong-zheng, Yang Zong-jie, Guo Run, Chen Yang-jie, Li Hai-feng, Hu Wan-ru, Dong Jian, Yang Zhan-qi, Xu Ting, Zeng Wei-jie, Ma You-ting, Zhang |
description | The misty mura defect of OGM products seriously affects the product appearance yield. It was found that the misty mura is caused by insufficient adhesion of the photoresist. In this paper, etch and photo process conditions were optimized and verified. We found that extending the metal photo oven time and increasing temperature can significantly decrease the misty Mura level. In addition, adding anneal (140 °C, 15min) after photo oven, the misty mura can be completely alleviated without any other problems at the same time. |
doi_str_mv | 10.1002/sdtp.13220 |
format | article |
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subjects | anneal Annealing furnaces misty mura OGM oven photoresist Photoresists |
title | P‐65: Misty Mura Defect of OGM Products Research |
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