Loading…

P‐65: Misty Mura Defect of OGM Products Research

The misty mura defect of OGM products seriously affects the product appearance yield. It was found that the misty mura is caused by insufficient adhesion of the photoresist. In this paper, etch and photo process conditions were optimized and verified. We found that extending the metal photo oven tim...

Full description

Saved in:
Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2019-06, Vol.50 (1), p.1477-1480
Main Authors: Yong-fei, Li, Zhong-zheng, Yang, Zong-jie, Guo, Run, Chen, Yang-jie, Li, Hai-feng, Hu, Wan-ru, Dong, Jian, Yang, Zhan-qi, Xu, Ting, Zeng, Wei-jie, Ma, You-ting, Zhang
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites cdi_FETCH-LOGICAL-c1050-16261c287e3f976eafe01e4d2ecced9afc51262364214c28735491d20afccf723
container_end_page 1480
container_issue 1
container_start_page 1477
container_title SID International Symposium Digest of technical papers
container_volume 50
creator Yong-fei, Li
Zhong-zheng, Yang
Zong-jie, Guo
Run, Chen
Yang-jie, Li
Hai-feng, Hu
Wan-ru, Dong
Jian, Yang
Zhan-qi, Xu
Ting, Zeng
Wei-jie, Ma
You-ting, Zhang
description The misty mura defect of OGM products seriously affects the product appearance yield. It was found that the misty mura is caused by insufficient adhesion of the photoresist. In this paper, etch and photo process conditions were optimized and verified. We found that extending the metal photo oven time and increasing temperature can significantly decrease the misty Mura level. In addition, adding anneal (140 °C, 15min) after photo oven, the misty mura can be completely alleviated without any other problems at the same time.
doi_str_mv 10.1002/sdtp.13220
format article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2231406860</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2231406860</sourcerecordid><originalsourceid>FETCH-LOGICAL-c1050-16261c287e3f976eafe01e4d2ecced9afc51262364214c28735491d20afccf723</originalsourceid><addsrcrecordid>eNp90MFKw0AQBuBFFKzVi0-w4E1InZndbBpvUrUKLS1awdsSNrPYUk3dTZDefASf0ScxNZ49zWG-fwZ-IU4RBghAF7GsNwNURLAneoRmmACm-b7oAeRZkhvzfCiOYlwBKKV13hM0__78MumlnC5jvZXTJhTymj27WlZezsZTOQ9V2bg6ygeOXAT3ciwOfLGOfPI3--Lp9mYxuksms_H96GqSOIQUEjRk0NEwY-XzzHDhGZB1Sewcl3nhXYpkSBlNqHdOpTrHkqDdOJ-R6ouz7u4mVO8Nx9quqia8tS8tkUINZmigVeedcqGKMbC3m7B8LcLWIthdJ3bXif3tpMXY4Y_lmrf_SPt4vZh3mR_JD2Hq</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2231406860</pqid></control><display><type>article</type><title>P‐65: Misty Mura Defect of OGM Products Research</title><source>Wiley:Jisc Collections:Wiley Read and Publish Open Access 2024-2025 (reading list)</source><creator>Yong-fei, Li ; Zhong-zheng, Yang ; Zong-jie, Guo ; Run, Chen ; Yang-jie, Li ; Hai-feng, Hu ; Wan-ru, Dong ; Jian, Yang ; Zhan-qi, Xu ; Ting, Zeng ; Wei-jie, Ma ; You-ting, Zhang</creator><creatorcontrib>Yong-fei, Li ; Zhong-zheng, Yang ; Zong-jie, Guo ; Run, Chen ; Yang-jie, Li ; Hai-feng, Hu ; Wan-ru, Dong ; Jian, Yang ; Zhan-qi, Xu ; Ting, Zeng ; Wei-jie, Ma ; You-ting, Zhang</creatorcontrib><description>The misty mura defect of OGM products seriously affects the product appearance yield. It was found that the misty mura is caused by insufficient adhesion of the photoresist. In this paper, etch and photo process conditions were optimized and verified. We found that extending the metal photo oven time and increasing temperature can significantly decrease the misty Mura level. In addition, adding anneal (140 °C, 15min) after photo oven, the misty mura can be completely alleviated without any other problems at the same time.</description><identifier>ISSN: 0097-966X</identifier><identifier>EISSN: 2168-0159</identifier><identifier>DOI: 10.1002/sdtp.13220</identifier><language>eng</language><publisher>Campbell: Wiley Subscription Services, Inc</publisher><subject>anneal ; Annealing furnaces ; misty mura ; OGM ; oven ; photoresist ; Photoresists</subject><ispartof>SID International Symposium Digest of technical papers, 2019-06, Vol.50 (1), p.1477-1480</ispartof><rights>2019 The Society for Information Display</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c1050-16261c287e3f976eafe01e4d2ecced9afc51262364214c28735491d20afccf723</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids></links><search><creatorcontrib>Yong-fei, Li</creatorcontrib><creatorcontrib>Zhong-zheng, Yang</creatorcontrib><creatorcontrib>Zong-jie, Guo</creatorcontrib><creatorcontrib>Run, Chen</creatorcontrib><creatorcontrib>Yang-jie, Li</creatorcontrib><creatorcontrib>Hai-feng, Hu</creatorcontrib><creatorcontrib>Wan-ru, Dong</creatorcontrib><creatorcontrib>Jian, Yang</creatorcontrib><creatorcontrib>Zhan-qi, Xu</creatorcontrib><creatorcontrib>Ting, Zeng</creatorcontrib><creatorcontrib>Wei-jie, Ma</creatorcontrib><creatorcontrib>You-ting, Zhang</creatorcontrib><title>P‐65: Misty Mura Defect of OGM Products Research</title><title>SID International Symposium Digest of technical papers</title><description>The misty mura defect of OGM products seriously affects the product appearance yield. It was found that the misty mura is caused by insufficient adhesion of the photoresist. In this paper, etch and photo process conditions were optimized and verified. We found that extending the metal photo oven time and increasing temperature can significantly decrease the misty Mura level. In addition, adding anneal (140 °C, 15min) after photo oven, the misty mura can be completely alleviated without any other problems at the same time.</description><subject>anneal</subject><subject>Annealing furnaces</subject><subject>misty mura</subject><subject>OGM</subject><subject>oven</subject><subject>photoresist</subject><subject>Photoresists</subject><issn>0097-966X</issn><issn>2168-0159</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNp90MFKw0AQBuBFFKzVi0-w4E1InZndbBpvUrUKLS1awdsSNrPYUk3dTZDefASf0ScxNZ49zWG-fwZ-IU4RBghAF7GsNwNURLAneoRmmACm-b7oAeRZkhvzfCiOYlwBKKV13hM0__78MumlnC5jvZXTJhTymj27WlZezsZTOQ9V2bg6ygeOXAT3ciwOfLGOfPI3--Lp9mYxuksms_H96GqSOIQUEjRk0NEwY-XzzHDhGZB1Sewcl3nhXYpkSBlNqHdOpTrHkqDdOJ-R6ouz7u4mVO8Nx9quqia8tS8tkUINZmigVeedcqGKMbC3m7B8LcLWIthdJ3bXif3tpMXY4Y_lmrf_SPt4vZh3mR_JD2Hq</recordid><startdate>201906</startdate><enddate>201906</enddate><creator>Yong-fei, Li</creator><creator>Zhong-zheng, Yang</creator><creator>Zong-jie, Guo</creator><creator>Run, Chen</creator><creator>Yang-jie, Li</creator><creator>Hai-feng, Hu</creator><creator>Wan-ru, Dong</creator><creator>Jian, Yang</creator><creator>Zhan-qi, Xu</creator><creator>Ting, Zeng</creator><creator>Wei-jie, Ma</creator><creator>You-ting, Zhang</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SC</scope><scope>7SP</scope><scope>8FD</scope><scope>JQ2</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope></search><sort><creationdate>201906</creationdate><title>P‐65: Misty Mura Defect of OGM Products Research</title><author>Yong-fei, Li ; Zhong-zheng, Yang ; Zong-jie, Guo ; Run, Chen ; Yang-jie, Li ; Hai-feng, Hu ; Wan-ru, Dong ; Jian, Yang ; Zhan-qi, Xu ; Ting, Zeng ; Wei-jie, Ma ; You-ting, Zhang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1050-16261c287e3f976eafe01e4d2ecced9afc51262364214c28735491d20afccf723</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>anneal</topic><topic>Annealing furnaces</topic><topic>misty mura</topic><topic>OGM</topic><topic>oven</topic><topic>photoresist</topic><topic>Photoresists</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yong-fei, Li</creatorcontrib><creatorcontrib>Zhong-zheng, Yang</creatorcontrib><creatorcontrib>Zong-jie, Guo</creatorcontrib><creatorcontrib>Run, Chen</creatorcontrib><creatorcontrib>Yang-jie, Li</creatorcontrib><creatorcontrib>Hai-feng, Hu</creatorcontrib><creatorcontrib>Wan-ru, Dong</creatorcontrib><creatorcontrib>Jian, Yang</creatorcontrib><creatorcontrib>Zhan-qi, Xu</creatorcontrib><creatorcontrib>Ting, Zeng</creatorcontrib><creatorcontrib>Wei-jie, Ma</creatorcontrib><creatorcontrib>You-ting, Zhang</creatorcontrib><collection>CrossRef</collection><collection>Computer and Information Systems Abstracts</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts – Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><jtitle>SID International Symposium Digest of technical papers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yong-fei, Li</au><au>Zhong-zheng, Yang</au><au>Zong-jie, Guo</au><au>Run, Chen</au><au>Yang-jie, Li</au><au>Hai-feng, Hu</au><au>Wan-ru, Dong</au><au>Jian, Yang</au><au>Zhan-qi, Xu</au><au>Ting, Zeng</au><au>Wei-jie, Ma</au><au>You-ting, Zhang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>P‐65: Misty Mura Defect of OGM Products Research</atitle><jtitle>SID International Symposium Digest of technical papers</jtitle><date>2019-06</date><risdate>2019</risdate><volume>50</volume><issue>1</issue><spage>1477</spage><epage>1480</epage><pages>1477-1480</pages><issn>0097-966X</issn><eissn>2168-0159</eissn><abstract>The misty mura defect of OGM products seriously affects the product appearance yield. It was found that the misty mura is caused by insufficient adhesion of the photoresist. In this paper, etch and photo process conditions were optimized and verified. We found that extending the metal photo oven time and increasing temperature can significantly decrease the misty Mura level. In addition, adding anneal (140 °C, 15min) after photo oven, the misty mura can be completely alleviated without any other problems at the same time.</abstract><cop>Campbell</cop><pub>Wiley Subscription Services, Inc</pub><doi>10.1002/sdtp.13220</doi><tpages>4</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0097-966X
ispartof SID International Symposium Digest of technical papers, 2019-06, Vol.50 (1), p.1477-1480
issn 0097-966X
2168-0159
language eng
recordid cdi_proquest_journals_2231406860
source Wiley:Jisc Collections:Wiley Read and Publish Open Access 2024-2025 (reading list)
subjects anneal
Annealing furnaces
misty mura
OGM
oven
photoresist
Photoresists
title P‐65: Misty Mura Defect of OGM Products Research
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T11%3A46%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=P%E2%80%9065:%20Misty%20Mura%20Defect%20of%20OGM%20Products%20Research&rft.jtitle=SID%20International%20Symposium%20Digest%20of%20technical%20papers&rft.au=Yong-fei,%20Li&rft.date=2019-06&rft.volume=50&rft.issue=1&rft.spage=1477&rft.epage=1480&rft.pages=1477-1480&rft.issn=0097-966X&rft.eissn=2168-0159&rft_id=info:doi/10.1002/sdtp.13220&rft_dat=%3Cproquest_cross%3E2231406860%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c1050-16261c287e3f976eafe01e4d2ecced9afc51262364214c28735491d20afccf723%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2231406860&rft_id=info:pmid/&rfr_iscdi=true