Formation of Fine Pattern by Reaction Development Patterning Using Photo-Base Generator and Acidic Developers

Reaction development patterning (RDP) applicable to polyacetals was investigated by using inverse acid-base condition, namely, photo-base generator and acidic developers. Polyacetal films composed of polyacetals, O-phenylacetyl 2-acetonaphthone oxime as a photo-base generator and benzophenone as a p...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2018/06/25, Vol.31(5), pp.613-616
Main Authors: Tokoro, Yuichiro, Hayashi, Hiromi, Oyama, Toshiyuki
Format: Article
Language:English
Subjects:
Mercury lamps
Methanesulfonic acid
Patterning
Photo-base generator
Photosensitive polyacetals
Positive-tone pattern
Reaction development patterning
Sulfuric acid
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Summary:Reaction development patterning (RDP) applicable to polyacetals was investigated by using inverse acid-base condition, namely, photo-base generator and acidic developers. Polyacetal films composed of polyacetals, O-phenylacetyl 2-acetonaphthone oxime as a photo-base generator and benzophenone as a photosensitizer gave positive-tone patterns after irradiation with an ultrahigh-pressure mercury lamp and successive dipping in developer containing carboxylic acid, methanesulfonic acid or sulfuric acid. Reduction in thickness at the unexposed area was inhibited by incorporation of trifluoromethyl groups to polyacetals.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.31.613