The key factor for fabricating through-hole TiO2 nanotube arrays: a fluoride-rich layer between Ti substrate and nanotubes

Through-hole TiO 2 nanotube arrays (THTNA) are fabricated successfully by applying a large-voltage pulse (Δ V  ≥ 40 V) at the end of anodization, and a mechanism is proposed that the fluoride-rich layer (FRL) between Ti substrate and nanotubes is the key factor for fabricating THTNA. In order to con...

Full description

Saved in:
Bibliographic Details
Published in:Journal of materials science 2014-10, Vol.49 (19), p.6742-6749
Main Authors: Luo, Zhi-Yong, Mo, Dong-Chuan, Lu, Shu-Shen
Format: Article
Language:English
Subjects:
Arrays
Characterization and Evaluation of Materials
Chemistry and Materials Science
Classical Mechanics
Crystallography and Scattering Methods
Electric potential
Fluorides
Fluorine
Materials Science
Morphology
Nanotubes
Polymer Sciences
Solid Mechanics
Substrates
Temperature effects
Titanium dioxide
Wall thickness
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Through-hole TiO 2 nanotube arrays (THTNA) are fabricated successfully by applying a large-voltage pulse (Δ V  ≥ 40 V) at the end of anodization, and a mechanism is proposed that the fluoride-rich layer (FRL) between Ti substrate and nanotubes is the key factor for fabricating THTNA. In order to confirm the mechanism, the effects of temperature of voltage pulse on the morphology of the bottom of TiO 2 nanotubes are explored. The results show the inner diameter of the bottom became larger with the temperature increasing due to the wall thickness of bottom of TiO 2 nanotubes decreased and assisted by the increased fluorine content of the bottom, which is strong evidence for the mechanism proposed. What is more, the inner diameter of the bottom of THTNA can be manipulated via this novel mechanism.
ISSN:0022-2461
1573-4803
DOI:10.1007/s10853-014-8368-z