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Correlation between grain orientation and carrier concentration of poly-crystalline In2O3 thin film grown by MOCVD

In this study, various In 2 O 3 thin films were grown on c -plane sapphire substrates by metal–organic chemical vapor deposition via changing the growth parameters. The structural and electrical properties of the films were investigated by employing the X-ray diffraction (XRD), scanning electron mic...

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Bibliographic Details
Published in:Journal of materials science 2015-02, Vol.50 (3), p.1058-1064
Main Authors: Hu, Ruiqin, Pei, Yanli, Chen, Zimin, Yang, Jingchuan, Lin, Jiayong, Li, Ya, Liang, Jun, Fan, Bingfeng, Wang, Gang
Format: Article
Language:English
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Summary:In this study, various In 2 O 3 thin films were grown on c -plane sapphire substrates by metal–organic chemical vapor deposition via changing the growth parameters. The structural and electrical properties of the films were investigated by employing the X-ray diffraction (XRD), scanning electron microscopy, conductive atomic force microscopy (CAFM), and Hall Effect measurement. Results revealed that the investigated In 2 O 3 thin films are bcc phase poly-crystalline with preferred orientation along the [100] or [111] direction. Moreover, the existence of two types of grains with different conductivities in the investigated In 2 O 3 thin films was confirmed by CAFM measurement. Interestingly, a positive correlation was found between carrier concentrations and (222)/(400) XRD diffraction peak intensity ratios of the investigated In 2 O 3 thin films. The mechanism of the positive correlation was explained by the difference in impurities concentrations between the two types of grains with the difference crystalline orientations.
ISSN:0022-2461
1573-4803
DOI:10.1007/s10853-014-8662-9