Cálculo de constantes ópticas de peliculas delgadas de Silicio compensado a través del método de Swanepoel

Characterization and determination of the optical constants for thin film silicon compensated through the transmittance spectrum is presented. Such properties were determined by R. Swanepoel model. Comparison between the refractive indices of pure silicon and silicon compensated. Increasing refracti...

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Bibliographic Details
Published in:arXiv.org 2019-07
Main Authors: Rojas C, W A, Chaparro P, M, Pardo C, L M, Cruz F, M I
Format: Article
Language:English
Subjects:
Permittivity
Photovoltaic cells
Refractivity
Silicon
Silicon films
Thin films
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Summary:Characterization and determination of the optical constants for thin film silicon compensated through the transmittance spectrum is presented. Such properties were determined by R. Swanepoel model. Comparison between the refractive indices of pure silicon and silicon compensated. Increasing refractive index behavior at low wavelengths in both plots was observed. The difference lies in the concentration and type of element that has been added to the thin film. The behavior of the dielectric constant was studied, their relationship with the refractive index. It is found that the value of the dielectric constant to a thin film of silicon compensated agree with those reported in the literature. The reported value of the gap for pure silicon corresponds to \( 1.11eV \) and the value of the gap for the sample corresponds to \( 0.7275eV \), the discrepancy is due to the level of concentration in the compensated silicon film.
ISSN:2331-8422