Contact mechanics of a flexible imprinter for photocured nanoimprint lithography

A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can tr...

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Bibliographic Details
Published in:Tribology letters 2005-05, Vol.19 (1), p.59-63
Main Authors: McClelland, G.M., Rettner, C.T., Hart, M.W., Carter, K.R., Sanchez, M.I., Best, M.E., Terris, B.D.
Format: Article
Language:English
Subjects:
Information storage
Lithography
Mechanics (physics)
Multilayers
Nanolithography
Photocuring
Substrates
Tribology
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Summary:A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage.
ISSN:1023-8883
1573-2711
DOI:10.1007/s11249-005-4265-6