Al 2 O 3 /TiO 2 double layer anti‐reflection coating film for crystalline silicon solar cells formed by spray pyrolysis

• Published in: Energy science & engineering 2016-07, Vol.4 (4), p.269-276
• Main Authors: Kanda, Hiroyuki, Uzum, Abdullah, Harano, Norihisa, Yoshinaga, Seiya, Ishikawa, Yasuaki, Uraoka, Yukiharu, Fukui, Hidehito, Harada, Tomitaro, Ito, Seigo
• Format: Article
• Language: English
• Subjects: Aluminum oxide; Annealing; Arc spraying; Chemical vapor deposition; Circuits; Computer simulation; Efficiency; Ellipsometry; Energy conversion; Energy conversion efficiency; Fourier transforms; Gas flow; Optical properties; Photoelectric effect; Photoelectric emission; Photovoltaic cells; Photovoltaics; Pyrolysis; Reflectance; Reflection; Silicon; Silicon wafers; Solar cells; Spectrum analysis; Spray pyrolysis; Thickness; Thin films; Titanium dioxide
• ISSN: 2050-0505; 2050-0505
• DOI: 10.1002/ese3.123

An Al 2 O 3 /TiO 2 double layer anti‐reflection coating ( ARC ) film formed by spray pyrolysis was introduced for monocrystalline silicon solar cells as the nonvacuum processing method. The thickness of the Al 2 O 3 layer and TiO 2 compact layer was controlled by the volume of deposited precursor solution and confirmed by ellipsometry and scanning electron microscopy. The average photovoltaic properties of photocurrent density ( J sc ), open‐circuit photovoltage ( V oc ), fill factor ( FF ), and photo energy conversion efficiency ( η ) were 37.0 mA /cm 2 , 590 mV , 0.712, and 15.5%, respectively. A significant improvement on J sc and η could be confirmed owing to the Al 2 O 3 /TiO 2 ARC . The results of Fourier transform infrared ( FTIR ) spectroscopy and optical simulation with modeling for the reflectance properties confirmed that C‐H‐based organics remained after the deposition of thin films.