P‐13.8: Influences of Passivation Hole Etching on the ITO and Metal Contact for Bottom Emission AMOLED Display

A top‐gate self‐aligned a‐IGZO TFT backplate with white OLED and color filter was demonstrated in this paper. Three kind of PV (passivation) hole etching sequences noted as case 1~3, were studied to verify the contact between ITO and Source/Drain electrode. For case 3, PV hole etching process after...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2019-09, Vol.50 (S1), p.975-978
Main Authors: Fan, Ying-chun, Zhang, Xiao-xing, Im, Jang-soon
Format: Article
Language:English
Subjects:
Active matrix displays
COA
corrosion
Etching
Indium gallium zinc oxide
Metal surfaces
Organic light emitting diodes
Passivation Hole Etching
Passivity
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Summary:A top‐gate self‐aligned a‐IGZO TFT backplate with white OLED and color filter was demonstrated in this paper. Three kind of PV (passivation) hole etching sequences noted as case 1~3, were studied to verify the contact between ITO and Source/Drain electrode. For case 3, PV hole etching process after PLN patterning shows smooth metal surface and excellent panel performance. In contrast, Sourse and Drain metal corrosion occurred due to non‐uniform PV film deposition in other two cases , resulting in bad contact between ITO and S/D metal and poor panel performance.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.13713