Tailoring the topological surface state in ultrathin \(\alpha\)-Sn (111) films

• Published in: arXiv.org 2019-12
• Main Authors: Rogalev, Victor A, Reis, Felix, Adler, Florian, Bauernfeind, Maximilian, Erhardt, Jonas, Kowalewski, André, Scholz, Markus R, Lenart Dudy, Duffy, Liam B, Hesjedal, Thorsten, Hoesch, Moritz, Bihlmayer, Gustav, Schäfer, Jörg, Claessen, Ralph
• Format: Article
• Language: English
• Subjects: Brillouin zones; Conduction bands; Crossovers; Density functional theory; Electronic structure; Electrons; Photoelectric emission; Thick films; Thickness; Topology; Valence band
• ISSN: 2331-8422
• DOI: 10.48550/arxiv.1910.11170

We report on the electronic structure of \(\alpha\)-Sn films in the very low thickness regime grown on InSb(111)A. High-resolution low photon energies angle-resolved photoemission (ARPES) allows for the direct observation of the linearly dispersing 2D topological surface states (TSSs) that exist between the second valence band and the conduction band. The Dirac point of this TSS was found to be 200meV below the Fermi level in 10-nm-thick \(\alpha\)-Sn films, which enables the observation of the hybridization gap opening at the Dirac point of the TSS for thinner films. The crossover to a quasi-2D electronic structure is accompanied by a full gap opening at the Brillouin zone center, in agreement with our density functional theory calculations. We further identify the thickness regime of \(\alpha\)-Sn films where the hybridization gap in TSS coexists with the topologically non-trivial electronic structure and one can expect the presence of a 1D helical edge states.