Inside Cover Picture: Plasma Process. Polym. 11/2019

Inside Front Cover: We establish a theoretical ground for capacitively coupled plasma (CCP) considering ion‐induced secondary electron emission (SEE) under low pressure. Plasma parameters are derived from kinetic theory including density, potential, sheath capacitance, power balance etc. Space poten...

Full description

Saved in:
Bibliographic Details
Published in:Plasma processes and polymers 2019-11, Vol.16 (11), p.n/a
Main Authors: Sun, Guang‐Yu, Li, Han‐Wei, Sun, An‐Bang, Li, Yuan, Song, Bai‐Peng, Mu, Hai‐Bao, Li, Xiao‐Ran, Zhang, Guan‐Jun
Format: Article
Language:English
Subjects:
Electron emission
Kinetic theory
Low pressure
Numerical models
Parameter estimation
Plasma
Sheaths
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Inside Front Cover: We establish a theoretical ground for capacitively coupled plasma (CCP) considering ion‐induced secondary electron emission (SEE) under low pressure. Plasma parameters are derived from kinetic theory including density, potential, sheath capacitance, power balance etc. Space potential is determined as a sum of time‐averaged component and oscillating component. The former is determined by emission coeffi cient and applied voltage, while the latter has limited relevance with SEE. A numerical model for quick estimation of CCP parameters is presented as well. Further details can be found in the article by Guang‐Yu Sun, Han‐Wei Li, An‐Bang Sun, Yuan Li, Bai‐Peng Song, Hai‐Bao Mu, Xiao‐Ran Li, and Guan‐Jun Zhang (1900093).
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.201970024