Deposition of Polytetrafluoroethylene Film Assisted by Synchrotron Radiation Irradiation

A novel process was developed for fabricating a polytetrafluoroethylene (PTFE) thin film using synchrotron radiation (SR). First, a PTFE substrate was exposed to high-energy X-rays (2–8 keV) at room temperature. Afterwards, the PTFE substrate (target) was heated under atmospheric pressure and fragme...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2019/06/24, Vol.32(2), pp.249-252
Main Authors: Takeuchi, Masaya, Izumi, Hirokazu, Ishihara, Mari, Kobayashi, Toshiro, Yamaguchi, Akinobu, Utsumi, Yuichi
Format: Article
Language:English
Subjects:
Deposition
Glass substrates
Organic chemistry
Polytetrafluoroethylene
Room temperature
Structural analysis
Synchrotron radiation
Thickness
Thin film
Thin films
X ray irradiation
X-ray
X-rays
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Summary:A novel process was developed for fabricating a polytetrafluoroethylene (PTFE) thin film using synchrotron radiation (SR). First, a PTFE substrate was exposed to high-energy X-rays (2–8 keV) at room temperature. Afterwards, the PTFE substrate (target) was heated under atmospheric pressure and fragments desorbed from the surface deposited on a glass substrate to produce a film with a thickness of above 10 µm. The characterization of the chemical structure of the deposited film was carried out using X-ray diffraction (XRD). The results indicated that the crystalline structure of the film became closer to those of the PTFE substrate upon an increase in the X-ray irradiation of the sample. The fabrication process of this PTFE thin film could be applied to various fields because surface modification of the substrate can be easily carried out.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.32.249