Impact of electron transport layer material on the performance of CH3NH3PbBr3 perovskite-based photodetectors

In the present article, the electron transport materials titanium oxide (TiO 2 ), bathocuproine (BCP) and phenyl-C 61 -butyric acid methyl ester (PCBM) were synthesized and investigated for the application in methylammonium lead bromide (CH 3 NH 3 PbBr 3 ) perovskite photodetectors. Results show tha...

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Bibliographic Details
Published in:Journal of materials science 2020-04, Vol.55 (10), p.4345-4357
Main Authors: Chaudhary, Jyoti, Gupta, Saral K., Verma, Ajay Singh, Negi, Chandra Mohan Singh
Format: Article
Language:English
Subjects:
Butyric acid
Carrier mobility
Characterization and Evaluation of Materials
Chemistry and Materials Science
Classical Mechanics
Crystallography and Scattering Methods
Current carriers
Electron transport
Electronic Materials
Energy levels
Materials Science
Perovskites
Photoelectric effect
Photoelectric emission
Photometers
Polymer Sciences
Selectivity
Solid Mechanics
Titanium dioxide
Titanium oxides
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Summary:In the present article, the electron transport materials titanium oxide (TiO 2 ), bathocuproine (BCP) and phenyl-C 61 -butyric acid methyl ester (PCBM) were synthesized and investigated for the application in methylammonium lead bromide (CH 3 NH 3 PbBr 3 ) perovskite photodetectors. Results show that device based on TiO 2 electron transport layer (ETL) shows higher photocurrent, responsivity and detectivity as compared to the devices based on BCP and PCBM ETL. However, ideality factor, charge carrier mobility, trap width and trap density were found to be comparable for the devices composed of BCP ETL and TiO 2 ETL. The TiO 2 ETL might help in the passivation of interface traps, form good quality intimate interfaces and offers more appropriate energy levels for effective blocking of holes and efficient extraction of electrons, resulting in the improved device performance. Through impedance spectroscopy analysis, the superior performance of the device with TiO 2 ETL can be attributed to the better contact selectivity and high recombination resistance.
ISSN:0022-2461
1573-4803
DOI:10.1007/s10853-019-04308-8