SUBMICRONIC PATTERNS USING LITHOGRAPHIC TECHNOLOGIES FOR FUTURE APPLICATIONS IN THE FIELD OF SENSORS

In this article are presented the main results of a project realized at INCDMTM whose main objective was to obtain submicronic patterns that can be used later for the design and manufacture of microsensors. Predefined submicronic geometric patterns were performed using electron beam lithography and...

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Bibliographic Details
Published in:International Journal of Mechatronics & Applied Mechanics 2019-08, Vol.1 (5), p.113-122
Main Authors: Badita, Liliana-Laura, Zapciu, Aurel, Gornoava, Valentin
Format: Article
Language:English
Subjects:
Atomic force microscopy
Copper
Corrosion
Electron beam lithography
Manufacturing
Microscopy
Phase transitions
Polymer films
Polymers
Semiconductors
Sensors
Silicon nitride
Silicon substrates
Tribology
Values
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Summary:In this article are presented the main results of a project realized at INCDMTM whose main objective was to obtain submicronic patterns that can be used later for the design and manufacture of microsensors. Predefined submicronic geometric patterns were performed using electron beam lithography and atomic force microscopy lithography on silicon and copper substrates. Predefined geometric shapes could be fully accomplished using electron beam lithography only on silicon samples. These patterns could not be obtained on the copper layer, probably due to the high roughness of the metallic layer. Using atomic force microscopy lithography, simple submicron patterns were made, even very simple compared to the predefined ones, on both types of substrate. Also, based on the atomic force microscopy analysis and the determination of the tribological parameters of the surfaces it was observed that nano-scale depth patterns were obtained using both types of lithography. Thus, it was concluded that predefined geometric submicronic patterns were realized completely and precisely only on the silicon substrate using electron beam lithography. Through an experimental development, it will be possible to make submicronic patterns as complete as possible which in the future can be used for the manufacture of sensors. These types of sensors will be implemented in complex mechatronic systems.
ISSN:2559-4397
2559-6497
DOI:10.17683/ijomam.issue5.18