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Bi@Bi4Ti3O12/TiO2 films on glass with photocatalytic and self‐cleaning performance

A stable and translucent Bi@Bi4Ti3O12/TiO2 film was fabricated on conventional glass substrates for the first time. The film exhibited a good photocatalytic performance and efficient self‐cleaning capability against organic dyes under full spectral irradiation and visible light irradiation. Bi4Ti3O1...

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Bibliographic Details
Published in:Journal of the American Ceramic Society 2020-05, Vol.103 (5), p.3104-3118
Main Authors: Lv, Xiang, Zhang, Zhengyi, Cao, Zhiqiang, Jiang, Wei, Shi, Lifen, Zhao, Xiaojuan, Ma, Liyun, Wang, Tianhe, Peng, Shou
Format: Article
Language:English
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Summary:A stable and translucent Bi@Bi4Ti3O12/TiO2 film was fabricated on conventional glass substrates for the first time. The film exhibited a good photocatalytic performance and efficient self‐cleaning capability against organic dyes under full spectral irradiation and visible light irradiation. Bi4Ti3O12/TiO2 film was first prepared on a glass substrate with colloidal silica as a high temperature binder, followed by implantation of nanoscale Bi in it by an in‐situ partially reduction of Bi4Ti3O12 to generate Bi@Bi4Ti3O12/TiO2 films. The improved photocatalytic ability is probably attributed to the surface plasmon resonance of Bi atom as well as the enhanced electron transfer efficiency and synergistic effect of Bi4Ti3O12 and TiO2. According to trapping experiments, hydroxyl radicals (OH) were active species in the photocatalytic degradation of dyes under full spectral light irradiation and possible photocatalytic mechanism was proposed. The film prepared in this work may well have potential practical applications in many aspects, such as cleansing treatments for high building external decorative panels and also systematic characterization of the film suggests that the in‐situ reduction is an effective and simple way to produce nanoscale Bi@Bi4Ti3O12. Self‐cleaning effect and photocatalytic mechanism of Bi@Bi4Ti3O12/TiO2 under full spectral irradiation.
ISSN:0002-7820
1551-2916
DOI:10.1111/jace.16974