Local Structure Analysis on Si-Containing DLC Films Based on the Measurement of C K-Edge and Si K-Edge X-ray Absorption Spectra

In this paper, the local structure of silicon-containing diamond-like carbon (Si-DLC) films is discussed based on the measurement of C K-edge and Si K-edge near-edge x-ray absorption fine structure (NEXAFS) spectra using the synchrotron radiation of 11 types of Si-DLC film fabricated with various sy...

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Bibliographic Details
Published in:Coatings (Basel) 2020-04, Vol.10 (4), p.330
Main Authors: Kanda, Kazuhiro, Suzuki, Shuto, Niibe, Masahito, Hasegawa, Takayuki, Suzuki, Tsuneo, Saitoh, Hedetoshi
Format: Article
Language:English
Subjects:
Absorption spectra
Carbon
Chemical vapor deposition
Diamond-like carbon films
Energy
Fine structure
Methods
Silicon
Structural analysis
Synchrotron radiation
X ray absorption
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Summary:In this paper, the local structure of silicon-containing diamond-like carbon (Si-DLC) films is discussed based on the measurement of C K-edge and Si K-edge near-edge x-ray absorption fine structure (NEXAFS) spectra using the synchrotron radiation of 11 types of Si-DLC film fabricated with various synthesis methods and having different elemental compositions. In the C K-edge NEXAFS spectra of the Si-DLC films, the σ* band shrunk and shifted to the lower-energy side, and the π* peak broadened with an increase in the Si content in the Si-DLC films. However, there were no significant changes observed in the Si K-edge NEXAFS spectra with an increase in the Si content. These results indicate that Si–Si bonding is not formed with precedence in Si-DLC film.
ISSN:2079-6412
2079-6412
DOI:10.3390/coatings10040330