High-k dielectric interlayered ITO/germanium Schottky photodiodes with low dark current and high photoconductive gain

• Published in: Journal of materials science 2020-07, Vol.55 (20), p.8630-8641
• Main Authors: Huang, Zhiwei, Yu, Chunyu, Chang, Ailing, Zhao, Yimo, Huang, Wei, Chen, Songyan, Li, Cheng
• Format: Article
• Language: English
• Subjects: Aluminum oxide; Characterization and Evaluation of Materials; Chemistry and Materials Science; Classical Mechanics; Crystallography and Scattering Methods; Dark current; Electronic Materials; Germanium; Hafnium oxide; Indium; Indium tin oxides; Interlayers; Materials Science; Photodiodes; Photometers; Polymer Sciences; Quantum efficiency; Solid Mechanics; Tin oxides
• ISSN: 0022-2461; 1573-4803
• DOI: 10.1007/s10853-020-04625-3

We propose a simple germanium Schottky photodiode, in which an ultrathin Al 2 O 3 or HfO 2 interlayer is inserted between the indium-doped tin oxide (ITO) and n -Ge contact, showing low dark current and ultra-high responsivity (gain). The introduction of 2 nm thick Al 2 O 3 interlayer in a ITO/ n -Ge Schottky photodetector results in 138 × reduction of dark current, and 16 × improvement of responsivity, exhibiting a low dark current density of 32 mA/cm 2 and high responsivity of 12.5 A/W (external quantum efficiency: 1183%) for 1310 nm and 7.3 A/W (external quantum efficiency: 584%) for 1550 nm at − 4 V reverse bias, respectively. The large responsivity up to 18.5 A/W is obtained for 1310 nm at − 9 V for ITO/Al 2 O 3 (2 nm)/ n -Ge diode, which corresponds to a large photoconductive gain of 24. Such a high photoconductive gain may be attributed to the capture of holes by the traps at the interface. These results are of significance for the fabrication of Ge photodetector with high performances.