On-site comparison of quantum Hall effect resistance standards of the KRISS and the BIPM: ongoing key comparison BIPM.EM-K12

• Published in: Metrologia 2020-01, Vol.57 (1A), p.1010
• Main Authors: Gournay, P, Rolland, B, Chae, D -H, Kim, W -S
• Format: Article
• Language: English
• Subjects: Electromagnetism; Onsite; Quantum Hall effect
• ISSN: 0026-1394; 1681-7575
• DOI: 10.1088/0026-1394/57/1A/01010

The ongoing on-site comparison BIPM.EM-K12 is part of the BIPM programme implemented to verify the international coherence of the primary resistance standards. It allows National Metrology Institutes (NMIs) to validate their implementations of the quantum Hall effect (QHE) for dc resistance traceability by comparison to the reference maintained at the BIPM. The realization of the ohm from the QHE-based standard of the NMIs at 100 Ω is compared with that realized by the BIPM from its own transportable quantum Hall resistance standard. This comparison is usually completed by scaling measurements from 100 Ω to 1 Ω and 10 kΩ through the measurement of the resistance ratios 100 Ω/1 Ω and 10 kΩ/100 Ω, respectively. In October 2019, a new BIPM.EM-K12 on-site comparison was carried out at the Korea Research Institute of Standards and Science (KRISS). It was the first time the KRISS participated in this comparison programme. Measurements of the 100 Ω transfer standard in terms of the SI value of the von Klitzing constant, R K , agreed to 4 parts in 10 10 with a relative combined standard uncertainty u c  = 24 × 10 −10 . Measurements of 10 kΩ/100 Ω and 100 Ω/1 Ω ratios agreed to 8 parts in 10 10 with u c  = 26 × 10 −10 and to 2 parts in 10 10 with u c  = 23 × 10 −10 , respectively. Main text To reach the main text of this paper, click on Final Report . Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/ . The final report has been peer-reviewed and approved for publication by the CCEM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).