The Planar Multipole Resonance Probe: A Minimally Invasive Monitoring Concept for Plasma-Assisted Dielectric Deposition Processes

In this article, a novel minimally invasive approach to plasma monitoring in the challenging environment of dielectric deposition processes based on the planar multipole resonance probe (pMRP) is presented. By placing the sensor on the plasma-remote side of a dielectric substrate to be coated, pertu...

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Bibliographic Details
Published in:IEEE transactions on microwave theory and techniques 2020-06, Vol.68 (6), p.2067-2079
Main Authors: Pohle, Dennis, Schulz, Christian, Oberberg, Moritz, Awakowicz, Peter, Rolfes, Ilona
Format: Article
Language:English
Subjects:
3-D electromagnetic simulations
Active plasma resonance spectroscopy (APRS)
Aluminum oxide
Argon
Chemicals
Coating effects
Coatings
Deposition
dielectric deposition
Dielectrics
Electric fields
Environmental monitoring
Ions
Multipoles
Oxygen plasma
planar multipole resonance probe (pMRP)
Plasma
plasma diagnostics
Plasmas
Polyethylene terephthalate
Probes
Process parameters
Remote sensors
Resonance
Resonance probes
Substrates
Thickness measurement
thin-film technology
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Summary:In this article, a novel minimally invasive approach to plasma monitoring in the challenging environment of dielectric deposition processes based on the planar multipole resonance probe (pMRP) is presented. By placing the sensor on the plasma-remote side of a dielectric substrate to be coated, perturbations of the process due to its presence can be significantly reduced. Since the electric field of the sensor is able to penetrate dielectric layers, a plasma supervision through the substrate is enabled. To investigate the effect of increasing coating thicknesses on the measurement performance for a broad spectrum of materials and plasma conditions, the results of extensive 3-D full-wave simulations performed with CST Microwave Studio are evaluated. Finally, real-time monitoring results of an argon-oxygen plasma during a sputter deposition with aluminum oxide on a polyethylene terephthalate (PET) film substrate together with a comparison to external process parameters are presented. The results demonstrate both the applicability of the proposed concept and its insensitivity to additional dielectric coatings.
ISSN:0018-9480
1557-9670
DOI:10.1109/TMTT.2020.2974835