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Promotional effects of B-terminated defective edges of Ni/boron nitride catalysts for coking- and sintering-resistant dry reforming of methane

[Display omitted] •Ni catalysts were confined in defects in boron nitride.•Superior stability and Ni sintering resistance were demonstrated for DRM.•The strong metal-support interaction effect was demonstrated.•The defect sites of BN play a key role in adsorption and activation of reaction gases.•Th...

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Published in:Applied catalysis. B, Environmental Environmental, 2020-06, Vol.267, p.118692, Article 118692
Main Authors: Bu, Kankan, Deng, Jiang, Zhang, Xiaoyu, Kuboon, Sanchai, Yan, Tingting, Li, Hongrui, Shi, Liyi, Zhang, Dengsong
Format: Article
Language:English
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Summary:[Display omitted] •Ni catalysts were confined in defects in boron nitride.•Superior stability and Ni sintering resistance were demonstrated for DRM.•The strong metal-support interaction effect was demonstrated.•The defect sites of BN play a key role in adsorption and activation of reaction gases.•The existence of B-terminal sites was directly used as active sites. It is urgent to develop highly sintering- and coking-resistance nickel-based catalysts for efficient dry reforming of methane (DRM). Here, we rationally designed and originally developed boron nitride defect-confined Ni catalysts (Ni/d-BN) for DRM by sonication-assisted alcoholysis and chemical peeling techniques. Ni/d-BN catalysts which exposed more B terminal sites exhibited very high catalytic activity, excellent stability and coking-resistance. The defect sites of BN were found to play a key role in adsorption and activation of reaction gases. The B-terminal sites in d-BN can be directly used as active sites for DRM reaction and it also can effectively promote the formation of B-O H*, thus increasing the rate of conversion of carbonate species and CHx* species into formate species, greatly promoting the formation of CO and effectively preventing coke deposition. This work paves the way for design of catalysts with simultaneous coking- and sintering-resistant of supported Ni-based catalysts for DRM applications.
ISSN:0926-3373
1873-3883
DOI:10.1016/j.apcatb.2020.118692