Nanoparticle formation through dewetting of a solid-state thin film on a substrate: A phase-field study

During dewetting of a solid-state thin film on a substrate, the film tends to agglomerate into islands to reduce its total interfacial energy, which can be utilized as an economical pattern formation technique. In this work, we are using a three-dimensional phase-field model to understand the condit...

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Bibliographic Details
Published in:Journal of alloys and compounds 2020-09, Vol.835, p.155163, Article 155163
Main Authors: Verma, Miral, Mukherjee, Rajdip
Format: Article
Language:English
Subjects:
Aspect ratio
Dewetting
Drying
Interfacial energy
Island creation
Nanoparticles
Phase-field model
Solid state
Substrates
Thin film
Thin films
Three dimensional models
Wetting
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Summary:During dewetting of a solid-state thin film on a substrate, the film tends to agglomerate into islands to reduce its total interfacial energy, which can be utilized as an economical pattern formation technique. In this work, we are using a three-dimensional phase-field model to understand the conditions and the mechanisms of island formation through pinch-off during dewetting of a finite cylindrical film on a substrate. It is observed that the pinch-off is mostly affected by the wetting angle, which is a function of interfacial energies between substrate, film, and vapor. The role of the aspect ratio of the cylindrical rod on island (nanoparticle) formation is also analysed. [Display omitted]
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2020.155163