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Single crystal growth and electrical transport properties of η-Mo4O11
Single crystals of quasi-two-dimensional charge-density-wave (CDW) material η-Mo4O11 were successfully grown by chemical vapor transport (CVT) method with TeCl4 and I2 as carrier gas, respectively. The obtained crystals with TeCl4 as carrier gas have a largest size of 16 × 6 × 0.8 mm3 with high qual...
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Published in: | Journal of alloys and compounds 2020-09, Vol.835, p.155417, Article 155417 |
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Main Authors: | , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Single crystals of quasi-two-dimensional charge-density-wave (CDW) material η-Mo4O11 were successfully grown by chemical vapor transport (CVT) method with TeCl4 and I2 as carrier gas, respectively. The obtained crystals with TeCl4 as carrier gas have a largest size of 16 × 6 × 0.8 mm3 with high quality determined by x-ray single-crystal diffraction, chemical analysis and electrical transport measurements. Temperature dependent resistivity shows that η-Mo4O11 is of highly anisotropy and undergoes successive CDW transitions at 105 K and 30 K, consistent with early reports. It is found that η-Mo4O11 with TeCl4 as carrier gas has a relative higher Residual Resistance Ratio (RRR), carrier density and mobility than that with I2 as carrier gas. This results in a much smaller magnetoresistance but pronounced Shubnikov-de Haas oscillations, providing opportunities to study the unusual oscillations of this compound beyond the quantum limit. For the Hall resistance, a drop above 10 T is reproduced corresponding to a steep increase of magnetoresistance.
•Large size single crystals of charge-density-wave material h-Mo4O11 were successfully grown by CVT with different carrier gas.•h-Mo4O11 with TeCl4 as carrier gas has a relative higher RRR, carrier density and mobility than that with I2.•Pronounced Shubnikov-de Haas oscillations and abnormal Hall effect have been observed. |
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ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2020.155417 |